Details
| Original language | English |
|---|---|
| Title of host publication | Advances in optical thin films II |
| Subtitle of host publication | 13 - 15 September 2005, Jena, Germany |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| ISBN (print) | 0-8194-5981-X |
| Publication status | Published - 4 Oct 2005 |
| Externally published | Yes |
| Event | Advances in Optical Thin Films II - Jena, Germany Duration: 13 Sept 2005 → 15 Sept 2005 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 5963 |
| ISSN (Print) | 0277-786X |
Abstract
During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.
Keywords
- Faraday cup, Ion assisted deposition, Ion emission profile, Multicup array, Retarding field analyzer
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
- Standard
- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
Advances in optical thin films II: 13 - 15 September 2005, Jena, Germany. Bellingham: SPIE, 2005. (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 5963).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Ion source characterization based on an array of retarding field analyzers
AU - Beermann, Nils
AU - Ehlers, Henrik
AU - Ristau, Detlev
PY - 2005/10/4
Y1 - 2005/10/4
N2 - During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.
AB - During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes [1]. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources [2]. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.
KW - Faraday cup
KW - Ion assisted deposition
KW - Ion emission profile
KW - Multicup array
KW - Retarding field analyzer
UR - http://www.scopus.com/inward/record.url?scp=33144468374&partnerID=8YFLogxK
U2 - 10.1117/12.625215
DO - 10.1117/12.625215
M3 - Conference contribution
AN - SCOPUS:33144468374
SN - 0-8194-5981-X
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in optical thin films II
PB - SPIE
CY - Bellingham
T2 - Advances in Optical Thin Films II
Y2 - 13 September 2005 through 15 September 2005
ER -