Details
| Original language | English |
|---|---|
| Pages (from-to) | 191-195 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 333 |
| Issue number | 1-2 |
| Publication status | Published - 25 Nov 1998 |
| Externally published | Yes |
Abstract
For ion-assisted deposition of thin MgF2 and YbF3 films a gridless end-Hall ion source has been used. The effects of ion energy, ion current and different working gases on the optical and mechanical properties of the single layers, deposited at ambient temperatures, have been investigated. For both materials, IAD with xenon proved to be superior to argon and argon-oxygen mixture, respectively. Compared to hot conventional films, the refractive indices of single layers deposited with optimized parameters could be increased. No significant absorption was observed in the vis spectral range for these layers, in the UV spectral range low absorption for IAD-coatings was achieved. With respect to the mechanical properties, the optimized IAD-MgF2-films were comparable to conventional coatings, and the durability of YbF3-films could be clearly enhanced by the applied IAD-process.
Keywords
- Fluorides, Ion bombardment, Optical coatings, Optical properties
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Materials Science(all)
- Surfaces, Coatings and Films
- Materials Science(all)
- Metals and Alloys
- Materials Science(all)
- Materials Chemistry
Cite this
- Standard
- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
In: Thin Solid Films, Vol. 333, No. 1-2, 25.11.1998, p. 191-195.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Ion beam-assisted deposition of MgF2 and YbF3 films
AU - Kennedy, M.
AU - Ristau, Detlev
AU - Niederwald, Hansjörg
N1 - Funding information: This work was supported by the Bundesministerium für Bildung, Wissenschaft, Forschung und Technologie (BMBF) under contract number 13 N 6989.
PY - 1998/11/25
Y1 - 1998/11/25
N2 - For ion-assisted deposition of thin MgF2 and YbF3 films a gridless end-Hall ion source has been used. The effects of ion energy, ion current and different working gases on the optical and mechanical properties of the single layers, deposited at ambient temperatures, have been investigated. For both materials, IAD with xenon proved to be superior to argon and argon-oxygen mixture, respectively. Compared to hot conventional films, the refractive indices of single layers deposited with optimized parameters could be increased. No significant absorption was observed in the vis spectral range for these layers, in the UV spectral range low absorption for IAD-coatings was achieved. With respect to the mechanical properties, the optimized IAD-MgF2-films were comparable to conventional coatings, and the durability of YbF3-films could be clearly enhanced by the applied IAD-process.
AB - For ion-assisted deposition of thin MgF2 and YbF3 films a gridless end-Hall ion source has been used. The effects of ion energy, ion current and different working gases on the optical and mechanical properties of the single layers, deposited at ambient temperatures, have been investigated. For both materials, IAD with xenon proved to be superior to argon and argon-oxygen mixture, respectively. Compared to hot conventional films, the refractive indices of single layers deposited with optimized parameters could be increased. No significant absorption was observed in the vis spectral range for these layers, in the UV spectral range low absorption for IAD-coatings was achieved. With respect to the mechanical properties, the optimized IAD-MgF2-films were comparable to conventional coatings, and the durability of YbF3-films could be clearly enhanced by the applied IAD-process.
KW - Fluorides
KW - Ion bombardment
KW - Optical coatings
KW - Optical properties
UR - http://www.scopus.com/inward/record.url?scp=0032204245&partnerID=8YFLogxK
U2 - 10.1016/S0040-6090(98)00847-5
DO - 10.1016/S0040-6090(98)00847-5
M3 - Article
AN - SCOPUS:0032204245
VL - 333
SP - 191
EP - 195
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 1-2
ER -