Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Lars O. Jensen
  • Mathias Mende
  • Holger Blaschke
  • Detlev Ristau
  • Duy Nguyen
  • Luke Emmert
  • Wolfgang Rudolph

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
  • University of New Mexico
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Details

Original languageEnglish
Title of host publication42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Subtitle of host publication2010
Publication statusPublished - 30 Nov 2010
Externally publishedYes
Event42nd Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2010 - Boulder, CO, United States
Duration: 26 Sept 201029 Sept 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7842
ISSN (Print)0277-786X

Abstract

After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.

Keywords

    LIDT, Oxide Mixtures, SiO/HfO

ASJC Scopus subject areas

Cite this

Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses. / Jensen, Lars O.; Mende, Mathias; Blaschke, Holger et al.
42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 784207 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7842).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Jensen, LO, Mende, M, Blaschke, H, Ristau, D, Nguyen, D, Emmert, L & Rudolph, W 2010, Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses. in 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010., 784207, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7842, 42nd Annual Laser Damage Symposium, Boulder, CO, United States, 26 Sept 2010. https://doi.org/10.1117/12.867238
Jensen, L. O., Mende, M., Blaschke, H., Ristau, D., Nguyen, D., Emmert, L., & Rudolph, W. (2010). Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses. In 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010 Article 784207 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7842). https://doi.org/10.1117/12.867238
Jensen LO, Mende M, Blaschke H, Ristau D, Nguyen D, Emmert L et al. Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses. In 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 784207. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.867238
Jensen, Lars O. ; Mende, Mathias ; Blaschke, Holger et al. / Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses. 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.",
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