Details
Original language | English |
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Title of host publication | 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
Subtitle of host publication | 2010 |
Publication status | Published - 30 Nov 2010 |
Externally published | Yes |
Event | 42nd Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2010 - Boulder, CO, United States Duration: 26 Sept 2010 → 29 Sept 2010 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Volume | 7842 |
ISSN (Print) | 0277-786X |
Abstract
After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
Keywords
- LIDT, Oxide Mixtures, SiO/HfO
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- BibTeX
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42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 784207 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7842).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses
AU - Jensen, Lars O.
AU - Mende, Mathias
AU - Blaschke, Holger
AU - Ristau, Detlev
AU - Nguyen, Duy
AU - Emmert, Luke
AU - Rudolph, Wolfgang
PY - 2010/11/30
Y1 - 2010/11/30
N2 - After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
AB - After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO2 could be steplessly mixed with SiO2. A study of SiO2/HfO2 IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.
KW - LIDT
KW - Oxide Mixtures
KW - SiO/HfO
UR - http://www.scopus.com/inward/record.url?scp=79751516687&partnerID=8YFLogxK
U2 - 10.1117/12.867238
DO - 10.1117/12.867238
M3 - Conference contribution
AN - SCOPUS:79751516687
SN - 9780819483652
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
T2 - 42nd Annual Laser Damage Symposium
Y2 - 26 September 2010 through 29 September 2010
ER -