Details
| Original language | English |
|---|---|
| Title of host publication | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 311-318 |
| Number of pages | 8 |
| ISBN (print) | 0-8194-3744-1 |
| Publication status | Published - 2 Nov 2000 |
| Externally published | Yes |
| Event | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - San Diego, CA, USA Duration: 30 Jul 2000 → 31 Jul 2000 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 4099 |
| ISSN (Print) | 0277-786X |
Abstract
In the course of the rapid progress of DUV/VUV lasers and their employment in semiconductor lithography, micro material processing, and medical surgery systems, the characterization of optical components in this spectral region gains of increasing importance. The precise determination of the optical properties, such as reflectance (R) and transmittance (T), is essential for further progresses of the components. Currently, standardized procedures for measurement of R&T are described in the international standard draft ISO/WD 15368, which is optimized for the whole wavelength range above DUV. In the DUV/VUV spectral range, scatter losses caused by the surface and bulk of the components increase with decreasing wavelengths. This effect is not considered in the standardized measurement procedures for T and R. In this study, a spectral photometer device, which has been developed at Laser Zentrum Hannover, will be presented. The set-up allows measurements of total reflectance for a defined acceptance angle range. In the current state, the DUV/VUV-photometer covers a spectral range from 115 nm up to 300 nm. Investigations on the scatter behavior of optics for this spectral range indicate a need for precise separation between ordinary reflected or transmitted beam and scattered radiation on the test samples. The dependence of the R and T values on the collection angles will by illustrated.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries. Bellingham: SPIE, 2000. p. 311-318 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 4099).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Investigations of transmittance and reflectance in the DUV/VUV spectral range
AU - Kadkhoda, Puja
AU - Blaschke, Holger
AU - Kohlhaas, Jürgen
AU - Ristau, Detlev
PY - 2000/11/2
Y1 - 2000/11/2
N2 - In the course of the rapid progress of DUV/VUV lasers and their employment in semiconductor lithography, micro material processing, and medical surgery systems, the characterization of optical components in this spectral region gains of increasing importance. The precise determination of the optical properties, such as reflectance (R) and transmittance (T), is essential for further progresses of the components. Currently, standardized procedures for measurement of R&T are described in the international standard draft ISO/WD 15368, which is optimized for the whole wavelength range above DUV. In the DUV/VUV spectral range, scatter losses caused by the surface and bulk of the components increase with decreasing wavelengths. This effect is not considered in the standardized measurement procedures for T and R. In this study, a spectral photometer device, which has been developed at Laser Zentrum Hannover, will be presented. The set-up allows measurements of total reflectance for a defined acceptance angle range. In the current state, the DUV/VUV-photometer covers a spectral range from 115 nm up to 300 nm. Investigations on the scatter behavior of optics for this spectral range indicate a need for precise separation between ordinary reflected or transmitted beam and scattered radiation on the test samples. The dependence of the R and T values on the collection angles will by illustrated.
AB - In the course of the rapid progress of DUV/VUV lasers and their employment in semiconductor lithography, micro material processing, and medical surgery systems, the characterization of optical components in this spectral region gains of increasing importance. The precise determination of the optical properties, such as reflectance (R) and transmittance (T), is essential for further progresses of the components. Currently, standardized procedures for measurement of R&T are described in the international standard draft ISO/WD 15368, which is optimized for the whole wavelength range above DUV. In the DUV/VUV spectral range, scatter losses caused by the surface and bulk of the components increase with decreasing wavelengths. This effect is not considered in the standardized measurement procedures for T and R. In this study, a spectral photometer device, which has been developed at Laser Zentrum Hannover, will be presented. The set-up allows measurements of total reflectance for a defined acceptance angle range. In the current state, the DUV/VUV-photometer covers a spectral range from 115 nm up to 300 nm. Investigations on the scatter behavior of optics for this spectral range indicate a need for precise separation between ordinary reflected or transmitted beam and scattered radiation on the test samples. The dependence of the R and T values on the collection angles will by illustrated.
UR - http://www.scopus.com/inward/record.url?scp=0034542517&partnerID=8YFLogxK
U2 - 10.1117/12.405831
DO - 10.1117/12.405831
M3 - Conference contribution
AN - SCOPUS:0034542517
SN - 0-8194-3744-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 311
EP - 318
BT - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
PB - SPIE
CY - Bellingham
T2 - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Y2 - 30 July 2000 through 31 July 2000
ER -