Details
| Original language | English |
|---|---|
| Title of host publication | Optical metrology roadmap for the semiconductor, optical, and data storage industries |
| Subtitle of host publication | 30 - 31 July 2000, San Diego, USA |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 65-73 |
| Number of pages | 9 |
| ISBN (print) | 0-8194-3744-1 |
| Publication status | Published - 2 Nov 2000 |
| Externally published | Yes |
| Event | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - San Diego, CA, USA Duration: 30 Jul 2000 → 31 Jul 2000 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 4099 |
| ISSN (Print) | 0277-786X |
Abstract
Optical scattering is a fundamental loss mechanism in high power laser applications, especially for optical systems in the DUV/VUV spectral range. For recording of total optical scattering (TS) several standardized measurement procedures which are optimized for the UV/VIS/NIR spectral range, are already existing. In this study, the problems of total scatter measurement techniques in the DUV/VUV will be discussed in respect to their practicability. In addition improvements for the standardized measurement procedures will be presented. TS measurements on selected coated laser components for 157 nm and 193 nm will be discussed in view of the loss mechanisms in thermally evaporated dielectric multilayer coating systems. The change of rms surface roughness of the components in dependence of the physical thickness of coated thin films will be described with the help of TS measurements. Also, the TS results for bare substrates in VUV and VIS will be compared and considered in relation to applications in short wavelength ranges.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
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Optical metrology roadmap for the semiconductor, optical, and data storage industries: 30 - 31 July 2000, San Diego, USA. Bellingham: SPIE, 2000. p. 65-73 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 4099).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Investigation on total scattering at 157 nm and 193 nm
AU - Kadkhoda, Puja
AU - Welling, Herbert
AU - Guenster, Stefan
AU - Ristau, Detlev
PY - 2000/11/2
Y1 - 2000/11/2
N2 - Optical scattering is a fundamental loss mechanism in high power laser applications, especially for optical systems in the DUV/VUV spectral range. For recording of total optical scattering (TS) several standardized measurement procedures which are optimized for the UV/VIS/NIR spectral range, are already existing. In this study, the problems of total scatter measurement techniques in the DUV/VUV will be discussed in respect to their practicability. In addition improvements for the standardized measurement procedures will be presented. TS measurements on selected coated laser components for 157 nm and 193 nm will be discussed in view of the loss mechanisms in thermally evaporated dielectric multilayer coating systems. The change of rms surface roughness of the components in dependence of the physical thickness of coated thin films will be described with the help of TS measurements. Also, the TS results for bare substrates in VUV and VIS will be compared and considered in relation to applications in short wavelength ranges.
AB - Optical scattering is a fundamental loss mechanism in high power laser applications, especially for optical systems in the DUV/VUV spectral range. For recording of total optical scattering (TS) several standardized measurement procedures which are optimized for the UV/VIS/NIR spectral range, are already existing. In this study, the problems of total scatter measurement techniques in the DUV/VUV will be discussed in respect to their practicability. In addition improvements for the standardized measurement procedures will be presented. TS measurements on selected coated laser components for 157 nm and 193 nm will be discussed in view of the loss mechanisms in thermally evaporated dielectric multilayer coating systems. The change of rms surface roughness of the components in dependence of the physical thickness of coated thin films will be described with the help of TS measurements. Also, the TS results for bare substrates in VUV and VIS will be compared and considered in relation to applications in short wavelength ranges.
UR - http://www.scopus.com/inward/record.url?scp=0034538622&partnerID=8YFLogxK
U2 - 10.1117/12.405837
DO - 10.1117/12.405837
M3 - Conference contribution
AN - SCOPUS:0034538622
SN - 0-8194-3744-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 65
EP - 73
BT - Optical metrology roadmap for the semiconductor, optical, and data storage industries
PB - SPIE
CY - Bellingham
T2 - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Y2 - 30 July 2000 through 31 July 2000
ER -