Details
| Original language | English |
|---|---|
| Title of host publication | 46th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Subtitle of host publication | 2014 |
| Publisher | SPIE |
| ISBN (electronic) | 9781628413007 |
| Publication status | Published - 31 Oct 2014 |
| Externally published | Yes |
| Event | 46th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2014 - Boulder, United States Duration: 14 Sept 2014 → 17 Sept 2014 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 9237 |
| ISSN (Print) | 0277-786X |
| ISSN (electronic) | 1996-756X |
Abstract
Having been of special interest in thin film technology for a long time already, mixtures of coating materials are still in the focus of research aiming for highest performance in high power as well as in ultra-short pulse laser applications. On the one hand, coating material combinations allow customizing the coating for a certain application by modifying advantageously the refractive index or the band gap energy. On the other hand, that technology is essential in the production of Rugate-filters, using gradually varied refractive index profiles. Therefore, it is of special interest to get insight into the composition of such mixed layers, not only in terms of refractive index and absorption coefficient, but also to evaluate the fractions of materials involved for gaining a better understanding, and therefore to reach highest possible reproducibility for production of such kind of thin films. In this work, single layers of binary mixtures of aluminum oxide, aluminum fluoride, and silicon dioxide are studied with respect to their composition using extreme ultraviolet reflectometry (EUV-R). As the penetration depth of EUV radiation is only a few tens of nanometers under grazing incidence, this non-invasive measurement technique is sensitive to the near surface composition of the film. Therefore it allows investigating the layer material independently of the substrate on which it was deposited. Using specific absorption edges of the involved materials in the EUV spectrum, an empirical correlation between EUV response and mixture ratio is developed and compared to the deep ultraviolet (VUV) absorption edges of the mixture materials.
Keywords
- Binary optical thin films, Contamination, High power laser, Metrology, Ultrafast laser optics, XUV/EUV
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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46th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2014. SPIE, 2014. 92371Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9237).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Investigation of binary coating material mixtures using grazing incidence EUV-reflectometry
AU - Balasa, Istvan
AU - Neiers, X.
AU - Mende, M.
AU - Jensen, L.
AU - Ristau, Detlev
PY - 2014/10/31
Y1 - 2014/10/31
N2 - Having been of special interest in thin film technology for a long time already, mixtures of coating materials are still in the focus of research aiming for highest performance in high power as well as in ultra-short pulse laser applications. On the one hand, coating material combinations allow customizing the coating for a certain application by modifying advantageously the refractive index or the band gap energy. On the other hand, that technology is essential in the production of Rugate-filters, using gradually varied refractive index profiles. Therefore, it is of special interest to get insight into the composition of such mixed layers, not only in terms of refractive index and absorption coefficient, but also to evaluate the fractions of materials involved for gaining a better understanding, and therefore to reach highest possible reproducibility for production of such kind of thin films. In this work, single layers of binary mixtures of aluminum oxide, aluminum fluoride, and silicon dioxide are studied with respect to their composition using extreme ultraviolet reflectometry (EUV-R). As the penetration depth of EUV radiation is only a few tens of nanometers under grazing incidence, this non-invasive measurement technique is sensitive to the near surface composition of the film. Therefore it allows investigating the layer material independently of the substrate on which it was deposited. Using specific absorption edges of the involved materials in the EUV spectrum, an empirical correlation between EUV response and mixture ratio is developed and compared to the deep ultraviolet (VUV) absorption edges of the mixture materials.
AB - Having been of special interest in thin film technology for a long time already, mixtures of coating materials are still in the focus of research aiming for highest performance in high power as well as in ultra-short pulse laser applications. On the one hand, coating material combinations allow customizing the coating for a certain application by modifying advantageously the refractive index or the band gap energy. On the other hand, that technology is essential in the production of Rugate-filters, using gradually varied refractive index profiles. Therefore, it is of special interest to get insight into the composition of such mixed layers, not only in terms of refractive index and absorption coefficient, but also to evaluate the fractions of materials involved for gaining a better understanding, and therefore to reach highest possible reproducibility for production of such kind of thin films. In this work, single layers of binary mixtures of aluminum oxide, aluminum fluoride, and silicon dioxide are studied with respect to their composition using extreme ultraviolet reflectometry (EUV-R). As the penetration depth of EUV radiation is only a few tens of nanometers under grazing incidence, this non-invasive measurement technique is sensitive to the near surface composition of the film. Therefore it allows investigating the layer material independently of the substrate on which it was deposited. Using specific absorption edges of the involved materials in the EUV spectrum, an empirical correlation between EUV response and mixture ratio is developed and compared to the deep ultraviolet (VUV) absorption edges of the mixture materials.
KW - Binary optical thin films
KW - Contamination
KW - High power laser
KW - Metrology
KW - Ultrafast laser optics
KW - XUV/EUV
UR - http://www.scopus.com/inward/record.url?scp=84923007663&partnerID=8YFLogxK
U2 - 10.1117/12.2068197
DO - 10.1117/12.2068197
M3 - Conference contribution
AN - SCOPUS:84923007663
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 46th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
PB - SPIE
T2 - 46th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2014
Y2 - 14 September 2014 through 17 September 2014
ER -