Details
| Original language | English |
|---|---|
| Article number | 074013 |
| Journal | Measurement science and technology |
| Volume | 31 |
| Issue number | 7 |
| Publication status | Published - Jul 2020 |
| Externally published | Yes |
Abstract
Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.
Keywords
- ellipsometry, metrology, numerical simulations, plasmonic lenses
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Instrumentation
- Engineering(all)
- Engineering (miscellaneous)
- Mathematics(all)
- Applied Mathematics
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In: Measurement science and technology, Vol. 31, No. 7, 074013, 07.2020.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Inverted plasmonic lens design for nanometrology applications
AU - Kaseberg, T.
AU - Siefke, T.
AU - Kroker, S.
AU - Bodermann, B.
N1 - Publisher Copyright: © 2020 The Author(s). Published by IOP Publishing Ltd.
PY - 2020/7
Y1 - 2020/7
N2 - Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.
AB - Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.
KW - ellipsometry
KW - metrology
KW - numerical simulations
KW - plasmonic lenses
UR - http://www.scopus.com/inward/record.url?scp=85085159050&partnerID=8YFLogxK
U2 - 10.1088/1361-6501/ab7e6b
DO - 10.1088/1361-6501/ab7e6b
M3 - Article
AN - SCOPUS:85085159050
VL - 31
JO - Measurement science and technology
JF - Measurement science and technology
SN - 0957-0233
IS - 7
M1 - 074013
ER -