Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Detlev Ristau
  • X. C. Dang
  • Jürgen Ebert

Research Organisations

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Details

Original languageEnglish
Title of host publicationLaser Induced Damage in Optical Materials
Subtitle of host publication1984
Pages298-312
Number of pages15
Publication statusPublished - 1986
EventLaser Induced Damage in Optical Materials 1984 - Boulder, United States
Duration: 15 Oct 198417 Oct 1984

Publication series

NameNational Bureau of Standards, Special Publication

Abstract

The authors describe an infrared line scanning technique for measuring the temporal and spatial development of a temperature field which is generated by a high power cw Nd-laser on the surface of a coated sample. A theoretical model based on the solution of the differential equation of heat transport for an instantaneous point source is discussed. In this theory the optical and thermal properties of a laser heated single layer are related to its temperature field. Investigations on a temperature calibration technique are made in order to rule out the effect of different emissivities of the coating materials under test. Interface and bulk absorption of single layers and multilayer stacks are measured and related to the laser damage threshold attained from 15 ns pulses at 1. 064 mu m. The layers are produced by e-beam evaporation and by ion-beam assisted deposition. Results are given on TiO//2, Ta//2O//5, HfO//2, Al//2O//3 and SiO//2.

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Cite this

Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm. / Ristau, Detlev; Dang, X. C.; Ebert, Jürgen.
Laser Induced Damage in Optical Materials: 1984. 1986. p. 298-312 (National Bureau of Standards, Special Publication).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Ristau, D, Dang, XC & Ebert, J 1986, Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm. in Laser Induced Damage in Optical Materials: 1984. National Bureau of Standards, Special Publication, pp. 298-312, Laser Induced Damage in Optical Materials 1984, Colorado, United States, 15 Oct 1984. https://doi.org/10.1520/STP23131S
Ristau, D., Dang, X. C., & Ebert, J. (1986). Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm. In Laser Induced Damage in Optical Materials: 1984 (pp. 298-312). (National Bureau of Standards, Special Publication). https://doi.org/10.1520/STP23131S
Ristau D, Dang XC, Ebert J. Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm. In Laser Induced Damage in Optical Materials: 1984. 1986. p. 298-312. (National Bureau of Standards, Special Publication). doi: 10.1520/STP23131S
Ristau, Detlev ; Dang, X. C. ; Ebert, Jürgen. / Interface and Bulk Absorption of Oxide Layers and Correlation to Damage Threshold at 1.06 μm. Laser Induced Damage in Optical Materials: 1984. 1986. pp. 298-312 (National Bureau of Standards, Special Publication).
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