Details
| Original language | English |
|---|---|
| Title of host publication | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI |
| Editors | Georg von Freymann, Eva Blasco, Debashis Chanda |
| Publisher | SPIE |
| ISBN (electronic) | 9781510659711 |
| Publication status | Published - 15 Mar 2023 |
| Event | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023 - San Francisco, United States Duration: 28 Jan 2023 → 3 Feb 2023 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 12433 |
| ISSN (Print) | 0277-786X |
| ISSN (electronic) | 1996-756X |
Abstract
In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
Keywords
- high-resolution structuring, scalable production, two-photon polymerization, UV-nanoimprint lithography
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Apa
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- BibTeX
- RIS
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. ed. / Georg von Freymann; Eva Blasco; Debashis Chanda. SPIE, 2023. 124330G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12433).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production
AU - Zheng, Lei
AU - Günther, Axel
AU - Caspary, Reinhard
AU - Kowalsky, Wolfgang
AU - Roth, Bernhard
N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).
PY - 2023/3/15
Y1 - 2023/3/15
N2 - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
AB - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.
KW - high-resolution structuring
KW - scalable production
KW - two-photon polymerization
KW - UV-nanoimprint lithography
UR - http://www.scopus.com/inward/record.url?scp=85159778837&partnerID=8YFLogxK
U2 - 10.1117/12.2648030
DO - 10.1117/12.2648030
M3 - Conference contribution
AN - SCOPUS:85159778837
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI
A2 - von Freymann, Georg
A2 - Blasco, Eva
A2 - Chanda, Debashis
PB - SPIE
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023
Y2 - 28 January 2023 through 3 February 2023
ER -