Details
| Original language | English |
|---|---|
| Pages (from-to) | 109-120 |
| Number of pages | 12 |
| Journal | Thin Solid Films |
| Volume | 682 |
| Publication status | Published - 10 May 2019 |
| Externally published | Yes |
Abstract
In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.
Keywords
- Broad ion beam, Industrial scale coating process, Ion beam sputter deposition, Optical coatings, Tantalum pentoxide, Thickness distribution, Titanium dioxide
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Materials Science(all)
- Surfaces, Coatings and Films
- Materials Science(all)
- Metals and Alloys
- Materials Science(all)
- Materials Chemistry
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In: Thin Solid Films, Vol. 682, 10.05.2019, p. 109-120.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering
AU - Sakiew, Wjatscheslaw
AU - Schrameyer, Stefan
AU - Jupé, Marco
AU - Schwerdtner, Philippe
AU - Erhart, Nick
AU - Starke, Kai
AU - Ristau, Detlev
N1 - Funding information: The authors are grateful to the German Federal Ministry of Education and Research (Bundesministerium für Bildung und Forschung, BMBF) for the financial support of the research project PluTO plus (contract no. 13N13207). Furthermore, the authors want to thank Dr. Benjamin Lotz (GIESS GmbH) for preparation of an ion optic with an elliptical shaped beamlet pattern and the authors want to thank the referees for valuable comments on the manuscript.
PY - 2019/5/10
Y1 - 2019/5/10
N2 - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.
AB - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.
KW - Broad ion beam
KW - Industrial scale coating process
KW - Ion beam sputter deposition
KW - Optical coatings
KW - Tantalum pentoxide
KW - Thickness distribution
KW - Titanium dioxide
UR - http://www.scopus.com/inward/record.url?scp=85065735751&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2019.05.027
DO - 10.1016/j.tsf.2019.05.027
M3 - Article
AN - SCOPUS:85065735751
VL - 682
SP - 109
EP - 120
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -