Details
| Original language | English |
|---|---|
| Title of host publication | Laser Applications in Microelectronic and Optoelectronic Manufacturing XV |
| Publication status | Published - 17 Feb 2010 |
| Externally published | Yes |
| Event | Laser Applications in Microelectronic and Optoelectronic Manufacturing XV - San Francisco, CA, United States Duration: 25 Jan 2010 → 28 Jan 2010 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 7584 |
| ISSN (Print) | 0277-786X |
Abstract
A parallel processing of two-photon polymerization structuring is demonstrated with spatial light modulator. Spatial light modulator generates multi-focus spots on the sample surface via phase modulation technique controlled by computer generated hologram pattern. Each focus spot can be individually controlled in position and laser intensity with computer generated hologram pattern displayed on spatial light modulator. The multi-focus spots two-photon polymerization achieves the fabrication of asymmetric structure. Moreover, smooth sine curved polymerized line with amplitude of 5 μm and a period of 200 μm was obtained by fast switching of CGH pattern.
Keywords
- CGH, Computer generated hologram, Femtosecond laser, Multi-focus spots, Parallel processing, Phase modulation, Two-photon polymerization
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Apa
- Vancouver
- BibTeX
- RIS
Laser Applications in Microelectronic and Optoelectronic Manufacturing XV. 2010. 75840L (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7584).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Individually controlled multi-focus laser processing for two-photon polymerization
AU - Obata, Kotaro
AU - Koch, Jürgen
AU - Chichkov, Boris N.
PY - 2010/2/17
Y1 - 2010/2/17
N2 - A parallel processing of two-photon polymerization structuring is demonstrated with spatial light modulator. Spatial light modulator generates multi-focus spots on the sample surface via phase modulation technique controlled by computer generated hologram pattern. Each focus spot can be individually controlled in position and laser intensity with computer generated hologram pattern displayed on spatial light modulator. The multi-focus spots two-photon polymerization achieves the fabrication of asymmetric structure. Moreover, smooth sine curved polymerized line with amplitude of 5 μm and a period of 200 μm was obtained by fast switching of CGH pattern.
AB - A parallel processing of two-photon polymerization structuring is demonstrated with spatial light modulator. Spatial light modulator generates multi-focus spots on the sample surface via phase modulation technique controlled by computer generated hologram pattern. Each focus spot can be individually controlled in position and laser intensity with computer generated hologram pattern displayed on spatial light modulator. The multi-focus spots two-photon polymerization achieves the fabrication of asymmetric structure. Moreover, smooth sine curved polymerized line with amplitude of 5 μm and a period of 200 μm was obtained by fast switching of CGH pattern.
KW - CGH
KW - Computer generated hologram
KW - Femtosecond laser
KW - Multi-focus spots
KW - Parallel processing
KW - Phase modulation
KW - Two-photon polymerization
UR - http://www.scopus.com/inward/record.url?scp=77951554986&partnerID=8YFLogxK
U2 - 10.1117/12.842117
DO - 10.1117/12.842117
M3 - Conference contribution
AN - SCOPUS:77951554986
SN - 9780819479808
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Laser Applications in Microelectronic and Optoelectronic Manufacturing XV
T2 - Laser Applications in Microelectronic and Optoelectronic Manufacturing XV
Y2 - 25 January 2010 through 28 January 2010
ER -