Imaging of oxide precipitates in silicon with ballistic phonons

Research output: Contribution to journalArticleResearchpeer review

Authors

  • W. Metzger
  • R. P. Huebener
  • R. J. Haug
  • H. U. Habermeier

External Research Organisations

  • University of Tübingen
  • Max Planck Institute for Solid State Research (MPI-FKF)
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Details

Original languageEnglish
Pages (from-to)1051-1053
Number of pages3
JournalApplied physics letters
Volume47
Issue number10
Publication statusPublished - 1 Dec 1985
Externally publishedYes

Abstract

Ballistic phonons were generated at low temperatures in nearly single-crystalline silicon by scanning the specimen surface with an electron beam. At the opposite sample surface the ballistic phonons were detected with two small-area bolometers placed at different locations. For a Si specimen which had been annealed for 150 h at 1050°C, the ballistic phonon image contained fine structure which could be attributed to oxide precipitates. Comparing the phonon images obtained with the two bolometers, we concluded that the structural inhomogeneities affecting the ballistic phonon propagation were located far from the specimen surface scanned by the electron beam. With these experiments a new principle of three-dimensional tomography based on ballistic phonons has been demonstrated.

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Cite this

Imaging of oxide precipitates in silicon with ballistic phonons. / Metzger, W.; Huebener, R. P.; Haug, R. J. et al.
In: Applied physics letters, Vol. 47, No. 10, 01.12.1985, p. 1051-1053.

Research output: Contribution to journalArticleResearchpeer review

Metzger, W, Huebener, RP, Haug, RJ & Habermeier, HU 1985, 'Imaging of oxide precipitates in silicon with ballistic phonons', Applied physics letters, vol. 47, no. 10, pp. 1051-1053. https://doi.org/10.1063/1.96375
Metzger W, Huebener RP, Haug RJ, Habermeier HU. Imaging of oxide precipitates in silicon with ballistic phonons. Applied physics letters. 1985 Dec 1;47(10):1051-1053. doi: 10.1063/1.96375
Metzger, W. ; Huebener, R. P. ; Haug, R. J. et al. / Imaging of oxide precipitates in silicon with ballistic phonons. In: Applied physics letters. 1985 ; Vol. 47, No. 10. pp. 1051-1053.
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