Details
Original language | English |
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Title of host publication | 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP) |
ISBN (electronic) | 9781728149486 |
Publication status | Published - Dec 2019 |
Externally published | Yes |
Abstract
A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.
Keywords
- diamond integrated photonics, infrared waveguides, isotropic etching, plasma etching, sulfur hexafluoride
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
- Engineering(all)
- Electrical and Electronic Engineering
- Computer Science(all)
- Computer Networks and Communications
Cite this
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2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP). 2019. 9059586.
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching
AU - Panduranga, Parashara
AU - Abdou, Aly
AU - Richter, Jens
AU - Thomas, Evan L H
AU - Mandal, Soumen
AU - Ren, Zhong
AU - Pedersen, Rasmus H
AU - Williams, Oliver A
AU - Witzens, Jeremy
AU - Nezhad, Maziar P
N1 - Publisher Copyright: © 2019 IEEE.
PY - 2019/12
Y1 - 2019/12
N2 - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.
AB - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.
KW - diamond integrated photonics
KW - infrared waveguides
KW - isotropic etching
KW - plasma etching
KW - sulfur hexafluoride
UR - http://www.scopus.com/inward/record.url?scp=85084115617&partnerID=8YFLogxK
U2 - 10.1109/BICOP48819.2019.9059586
DO - 10.1109/BICOP48819.2019.9059586
M3 - Conference contribution
BT - 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)
ER -