Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Parashara Panduranga
  • Aly Abdou
  • Jens Richter
  • Evan L H Thomas
  • Soumen Mandal
  • Zhong Ren
  • Rasmus H Pedersen
  • Oliver A Williams
  • Jeremy Witzens
  • Maziar P Nezhad

External Research Organisations

  • Cardiff University
View graph of relations

Details

Original languageEnglish
Title of host publication2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)
ISBN (electronic)9781728149486
Publication statusPublished - Dec 2019
Externally publishedYes

Abstract

A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.

Keywords

    diamond integrated photonics, infrared waveguides, isotropic etching, plasma etching, sulfur hexafluoride

ASJC Scopus subject areas

Cite this

Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching. / Panduranga, Parashara; Abdou, Aly; Richter, Jens et al.
2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP). 2019. 9059586.

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Panduranga, P, Abdou, A, Richter, J, Thomas, ELH, Mandal, S, Ren, Z, Pedersen, RH, Williams, OA, Witzens, J & Nezhad, MP 2019, Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching. in 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)., 9059586. https://doi.org/10.1109/BICOP48819.2019.9059586
Panduranga, P., Abdou, A., Richter, J., Thomas, E. L. H., Mandal, S., Ren, Z., Pedersen, R. H., Williams, O. A., Witzens, J., & Nezhad, M. P. (2019). Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching. In 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP) Article 9059586 https://doi.org/10.1109/BICOP48819.2019.9059586
Panduranga P, Abdou A, Richter J, Thomas ELH, Mandal S, Ren Z et al. Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching. In 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP). 2019. 9059586 doi: 10.1109/BICOP48819.2019.9059586
Panduranga, Parashara ; Abdou, Aly ; Richter, Jens et al. / Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF<sub>6</sub> Isotropic Etching. 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP). 2019.
Download
@inproceedings{094928bdd84a417c95facda7306e82be,
title = "Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching",
abstract = "A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.",
keywords = "diamond integrated photonics, infrared waveguides, isotropic etching, plasma etching, sulfur hexafluoride",
author = "Parashara Panduranga and Aly Abdou and Jens Richter and Thomas, {Evan L H} and Soumen Mandal and Zhong Ren and Pedersen, {Rasmus H} and Williams, {Oliver A} and Jeremy Witzens and Nezhad, {Maziar P}",
note = "Publisher Copyright: {\textcopyright} 2019 IEEE.",
year = "2019",
month = dec,
doi = "10.1109/BICOP48819.2019.9059586",
language = "English",
booktitle = "2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)",

}

Download

TY - GEN

T1 - Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching

AU - Panduranga, Parashara

AU - Abdou, Aly

AU - Richter, Jens

AU - Thomas, Evan L H

AU - Mandal, Soumen

AU - Ren, Zhong

AU - Pedersen, Rasmus H

AU - Williams, Oliver A

AU - Witzens, Jeremy

AU - Nezhad, Maziar P

N1 - Publisher Copyright: © 2019 IEEE.

PY - 2019/12

Y1 - 2019/12

N2 - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.

AB - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.

KW - diamond integrated photonics

KW - infrared waveguides

KW - isotropic etching

KW - plasma etching

KW - sulfur hexafluoride

UR - http://www.scopus.com/inward/record.url?scp=85084115617&partnerID=8YFLogxK

U2 - 10.1109/BICOP48819.2019.9059586

DO - 10.1109/BICOP48819.2019.9059586

M3 - Conference contribution

BT - 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)

ER -

By the same author(s)