High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Anne Harth
  • Piotr Rudawski
  • Chen Guo
  • Miguel Miranda
  • Eleonora Lorek
  • Erik Mårsell
  • Esben Witting Larsen
  • Christoph Heyl
  • Jan Matyschok
  • Thomas Binhammer
  • Uwe Morgner
  • Anders Mikkelsen
  • Anne L'Huillier
  • Cord Arnold

Research Organisations

External Research Organisations

  • Lund University
  • VENTEON GmbH
View graph of relations

Details

Original languageEnglish
Title of host publicationHigh Intensity Lasers and High Field Phenomena, HILAS 2014
PublisherOSA - The Optical Society
ISBN (print)9781557529954
Publication statusPublished - 2014
EventHigh Intensity Lasers and High Field Phenomena, HILAS 2014 - Messe Berlin, Berlin, Germany
Duration: 18 Mar 201420 Mar 2014

Publication series

NameOptics InfoBase Conference Papers
ISSN (electronic)2162-2701

ASJC Scopus subject areas

Cite this

High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications. / Harth, Anne; Rudawski, Piotr; Guo, Chen et al.
High Intensity Lasers and High Field Phenomena, HILAS 2014. OSA - The Optical Society, 2014. (Optics InfoBase Conference Papers).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Harth, A, Rudawski, P, Guo, C, Miranda, M, Lorek, E, Mårsell, E, Larsen, EW, Heyl, C, Matyschok, J, Binhammer, T, Morgner, U, Mikkelsen, A, L'Huillier, A & Arnold, C 2014, High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications. in High Intensity Lasers and High Field Phenomena, HILAS 2014. Optics InfoBase Conference Papers, OSA - The Optical Society, High Intensity Lasers and High Field Phenomena, HILAS 2014, Messe Berlin, Berlin, Germany, 18 Mar 2014. https://doi.org/10.1364/HILAS.2014.HTu2C.2
Harth, A., Rudawski, P., Guo, C., Miranda, M., Lorek, E., Mårsell, E., Larsen, E. W., Heyl, C., Matyschok, J., Binhammer, T., Morgner, U., Mikkelsen, A., L'Huillier, A., & Arnold, C. (2014). High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications. In High Intensity Lasers and High Field Phenomena, HILAS 2014 (Optics InfoBase Conference Papers). OSA - The Optical Society. https://doi.org/10.1364/HILAS.2014.HTu2C.2
Harth A, Rudawski P, Guo C, Miranda M, Lorek E, Mårsell E et al. High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications. In High Intensity Lasers and High Field Phenomena, HILAS 2014. OSA - The Optical Society. 2014. (Optics InfoBase Conference Papers). doi: 10.1364/HILAS.2014.HTu2C.2
Harth, Anne ; Rudawski, Piotr ; Guo, Chen et al. / High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications. High Intensity Lasers and High Field Phenomena, HILAS 2014. OSA - The Optical Society, 2014. (Optics InfoBase Conference Papers).
Download
@inproceedings{9929137af4374fb396bc5a9ae208298c,
title = "High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications",
author = "Anne Harth and Piotr Rudawski and Chen Guo and Miguel Miranda and Eleonora Lorek and Erik M{\aa}rsell and Larsen, {Esben Witting} and Christoph Heyl and Jan Matyschok and Thomas Binhammer and Uwe Morgner and Anders Mikkelsen and Anne L'Huillier and Cord Arnold",
year = "2014",
doi = "10.1364/HILAS.2014.HTu2C.2",
language = "English",
isbn = "9781557529954",
series = "Optics InfoBase Conference Papers",
publisher = "OSA - The Optical Society",
booktitle = "High Intensity Lasers and High Field Phenomena, HILAS 2014",
address = "United States",
note = "High Intensity Lasers and High Field Phenomena, HILAS 2014 ; Conference date: 18-03-2014 Through 20-03-2014",

}

Download

TY - GEN

T1 - High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications

AU - Harth, Anne

AU - Rudawski, Piotr

AU - Guo, Chen

AU - Miranda, Miguel

AU - Lorek, Eleonora

AU - Mårsell, Erik

AU - Larsen, Esben Witting

AU - Heyl, Christoph

AU - Matyschok, Jan

AU - Binhammer, Thomas

AU - Morgner, Uwe

AU - Mikkelsen, Anders

AU - L'Huillier, Anne

AU - Arnold, Cord

PY - 2014

Y1 - 2014

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85088345478&origin=inward&txGid=84cb810e529a8b4c06ad96ec7ef9b329

U2 - 10.1364/HILAS.2014.HTu2C.2

DO - 10.1364/HILAS.2014.HTu2C.2

M3 - Conference contribution

SN - 9781557529954

T3 - Optics InfoBase Conference Papers

BT - High Intensity Lasers and High Field Phenomena, HILAS 2014

PB - OSA - The Optical Society

T2 - High Intensity Lasers and High Field Phenomena, HILAS 2014

Y2 - 18 March 2014 through 20 March 2014

ER -

By the same author(s)