Details
Original language | English |
---|---|
Pages (from-to) | 19774-19785 |
Number of pages | 12 |
Journal | Journal of Physical Chemistry C |
Volume | 121 |
Issue number | 36 |
Publication status | Published - 14 Sept 2017 |
Abstract
We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 x n) and (n x 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 x 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component. (Graph Presented).
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Energy(all)
- General Energy
- Chemistry(all)
- Physical and Theoretical Chemistry
- Materials Science(all)
- Surfaces, Coatings and Films
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In: Journal of Physical Chemistry C, Vol. 121, No. 36, 14.09.2017, p. 19774-19785.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface
AU - Von Boehn, Bernhard
AU - Menteş, Tevfik O.
AU - Locatelli, Andrea
AU - Sala, Alessandro
AU - Imbihl, Ronald
N1 - Publisher Copyright: © 2017 American Chemical Society. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.
PY - 2017/9/14
Y1 - 2017/9/14
N2 - We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 x n) and (n x 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 x 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component. (Graph Presented).
AB - We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 x n) and (n x 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 x 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component. (Graph Presented).
UR - http://www.scopus.com/inward/record.url?scp=85029515548&partnerID=8YFLogxK
U2 - 10.1021/acs.jpcc.7b04809
DO - 10.1021/acs.jpcc.7b04809
M3 - Article
AN - SCOPUS:85029515548
VL - 121
SP - 19774
EP - 19785
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
SN - 1932-7447
IS - 36
ER -