Details
| Original language | English |
|---|---|
| Title of host publication | Modern Surface Technology |
| Pages | 31-50 |
| Number of pages | 20 |
| Publication status | Published - 28 Aug 2006 |
Keywords
- Classification, Coating configuration, CVD - chemical vapour deposition, Electrodeposition, Electroless plating processes, Gas-phase coating processes, Modern surface technology, Physical vapour deposition, Plasma properties, Thin-film coating processes, Thin-film technology
ASJC Scopus subject areas
- Engineering(all)
- General Engineering
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Modern Surface Technology. 2006. p. 31-50.
Research output: Chapter in book/report/conference proceeding › Contribution to book/anthology › Research › peer review
}
TY - CHAP
T1 - Fundamentals of Thin-film Technology
AU - Nicolaus, Martin
AU - Schäpers, Melanie
PY - 2006/8/28
Y1 - 2006/8/28
KW - Classification
KW - Coating configuration
KW - CVD - chemical vapour deposition
KW - Electrodeposition
KW - Electroless plating processes
KW - Gas-phase coating processes
KW - Modern surface technology
KW - Physical vapour deposition
KW - Plasma properties
KW - Thin-film coating processes
KW - Thin-film technology
UR - http://www.scopus.com/inward/record.url?scp=84889268221&partnerID=8YFLogxK
U2 - 10.1002/3527608818.ch3
DO - 10.1002/3527608818.ch3
M3 - Contribution to book/anthology
AN - SCOPUS:84889268221
SN - 3527315322
SN - 9783527315321
SP - 31
EP - 50
BT - Modern Surface Technology
ER -