Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Authors

  • L. A. Emmert
  • Duy Nguyen
  • Mark Mero
  • Wolfgang Rudolph
  • Detlev Ristau
  • Kai Starke
  • Marco Jupé
  • C. S. Menoni
  • D. Patel
  • E. Krous

External Research Organisations

  • University of New Mexico
  • Laser Zentrum Hannover e.V. (LZH)
  • Colorado State University
View graph of relations

Details

Original languageEnglish
Title of host publication41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Subtitle of host publication2009
Publication statusPublished - 31 Dec 2009
Externally publishedYes
Event41st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2009 - Boulder, CO, United States
Duration: 21 Sept 2009 → 23 Sept 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7504
ISSN (Print)0277-786X

Abstract

In this contribution we will summarize the fundamental mechanisms that lead to subpicosecond laser damage in dielectric films, discuss the resulting scaling laws of single pulse (1-on-1) damage with respect to pulse duration and bandgap, of the multiple pulse (S-on-1) damage threshold as a function of pulse number, and compare these findings to recent experimental results.

Keywords

    Laser-induced dielectric breakdown, Subpicosecond laser pulse

ASJC Scopus subject areas

Cite this

Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. / Emmert, L. A.; Nguyen, Duy; Mero, Mark et al.
41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. 75040P (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7504).

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Emmert, LA, Nguyen, D, Mero, M, Rudolph, W, Ristau, D, Starke, K, Jupé, M, Menoni, CS, Patel, D & Krous, E 2009, Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. in 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009., 75040P, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7504, 41st Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2009, Boulder, CO, United States, 21 Sept 2009. https://doi.org/10.1117/12.836508
Emmert, L. A., Nguyen, D., Mero, M., Rudolph, W., Ristau, D., Starke, K., Jupé, M., Menoni, C. S., Patel, D., & Krous, E. (2009). Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. In 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009 Article 75040P (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7504). https://doi.org/10.1117/12.836508
Emmert LA, Nguyen D, Mero M, Rudolph W, Ristau D, Starke K et al. Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. In 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. 75040P. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.836508
Emmert, L. A. ; Nguyen, Duy ; Mero, Mark et al. / Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films. 41st Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2009. 2009. (Proceedings of SPIE - The International Society for Optical Engineering).
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