Details
| Original language | English |
|---|---|
| Title of host publication | Advances in Optical Thin Films IV |
| Publication status | Published - 3 Oct 2011 |
| Externally published | Yes |
| Event | Advances in Optical Thin Films IV - Marseille, France Duration: 5 Sept 2011 → 7 Sept 2011 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 8168 |
| ISSN (Print) | 0277-786X |
Abstract
Ever increasing demands in the field of optical coating systems with highest complexity impose new challenges on the development of advanced deposition techniques with increased stability, and especially on the corresponding precise thickness monitoring strategies. Most of the classical thickness monitoring concepts employed in industrial production, which are based on quartz crystal or optical monitoring, are presently operated near to their precision limits. However, resulting from extensive research activities, monitoring concepts could be significantly extended during the last years. On the one hand, newly developed hybrid process control algorithms combine the information of the optical and non-optical sensors to achieve a higher precision and fault-tolerance. On the other hand, independent thickness monitors are integrated in flexible manufacturing concepts which include adapted computational manufacturing tools as well as specific re-calculation and design re-optimization modules. Computational manufacturing allows for a design preselection prior to deposition with essentially improved certainty which could not be achieved with classical error analysis until now. In contrast, the re-calculation and re-optimization modules are on-line tools that monitor the running deposition process. In case of critical deviations, a fully automated modification of the residual design assures a successful achievement of specifications under the chosen monitoring technique.
Keywords
- BBM, Computational manufacturing, Optical broadband monitoring, Optical thin films, Virtual deposition
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Advances in Optical Thin Films IV. 2011. 1 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8168).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - From independent thickness monitoring to adaptive manufacturing
T2 - Advances in Optical Thin Films IV
AU - Ehlers, Henrik
AU - Schlichting, Sebastian
AU - Schmitz, Carsten
AU - Ristau, Detlev
PY - 2011/10/3
Y1 - 2011/10/3
N2 - Ever increasing demands in the field of optical coating systems with highest complexity impose new challenges on the development of advanced deposition techniques with increased stability, and especially on the corresponding precise thickness monitoring strategies. Most of the classical thickness monitoring concepts employed in industrial production, which are based on quartz crystal or optical monitoring, are presently operated near to their precision limits. However, resulting from extensive research activities, monitoring concepts could be significantly extended during the last years. On the one hand, newly developed hybrid process control algorithms combine the information of the optical and non-optical sensors to achieve a higher precision and fault-tolerance. On the other hand, independent thickness monitors are integrated in flexible manufacturing concepts which include adapted computational manufacturing tools as well as specific re-calculation and design re-optimization modules. Computational manufacturing allows for a design preselection prior to deposition with essentially improved certainty which could not be achieved with classical error analysis until now. In contrast, the re-calculation and re-optimization modules are on-line tools that monitor the running deposition process. In case of critical deviations, a fully automated modification of the residual design assures a successful achievement of specifications under the chosen monitoring technique.
AB - Ever increasing demands in the field of optical coating systems with highest complexity impose new challenges on the development of advanced deposition techniques with increased stability, and especially on the corresponding precise thickness monitoring strategies. Most of the classical thickness monitoring concepts employed in industrial production, which are based on quartz crystal or optical monitoring, are presently operated near to their precision limits. However, resulting from extensive research activities, monitoring concepts could be significantly extended during the last years. On the one hand, newly developed hybrid process control algorithms combine the information of the optical and non-optical sensors to achieve a higher precision and fault-tolerance. On the other hand, independent thickness monitors are integrated in flexible manufacturing concepts which include adapted computational manufacturing tools as well as specific re-calculation and design re-optimization modules. Computational manufacturing allows for a design preselection prior to deposition with essentially improved certainty which could not be achieved with classical error analysis until now. In contrast, the re-calculation and re-optimization modules are on-line tools that monitor the running deposition process. In case of critical deviations, a fully automated modification of the residual design assures a successful achievement of specifications under the chosen monitoring technique.
KW - BBM
KW - Computational manufacturing
KW - Optical broadband monitoring
KW - Optical thin films
KW - Virtual deposition
UR - http://www.scopus.com/inward/record.url?scp=80455131169&partnerID=8YFLogxK
U2 - 10.1117/12.898598
DO - 10.1117/12.898598
M3 - Conference contribution
AN - SCOPUS:80455131169
SN - 9780819487940
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films IV
Y2 - 5 September 2011 through 7 September 2011
ER -