Details
| Original language | English |
|---|---|
| Title of host publication | Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 202-215 |
| Number of pages | 14 |
| ISBN (print) | 0-8194-4727-7 |
| Publication status | Published - 30 May 2003 |
| Externally published | Yes |
| Event | Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization - Boulder, CO, United States Duration: 16 Sept 2002 → 18 Sept 2002 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 4932 |
| ISSN (Print) | 0277-786X |
Abstract
The damage behavior of five different oxide dielectric thin films (Ta 2O5, TiO22, Al2O23, HfO2, and SiO2) has been investigated with ultrashort laser pulses with durations from 25 fs to 1 ps. At all pulse durations the damage threshold is well defined and scales with the bandgap energy of the material. The damage behavior can be described with a phenomenological model taking into account multi-photon excitation, impact ionization, and electron relaxation. The temporal evolution of the dielectric constant of the film following the excitation with pulses below the damage threshold has been measured with time-resolved pump-probe spectroscopy. The complex dielectric constant was retrieved from transient reflection and transmission data.
Keywords
- Laser damage, Pump-probe spectroscopy, Thin films, Ultrafast processes
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- BibTeX
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Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization. Bellingham: SPIE, 2003. p. 202-215 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 4932).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Femtosecond pulse damage and pre-damage behavior of dielectric thin films
AU - Mero, Mark
AU - Liu, Jianhua
AU - Sabbah, Ali
AU - Jasapara, Jayesh
AU - Starke, Kai
AU - Ristau, Detlev
AU - Mclver, John K.
AU - Rudolph, Wolfgang
PY - 2003/5/30
Y1 - 2003/5/30
N2 - The damage behavior of five different oxide dielectric thin films (Ta 2O5, TiO22, Al2O23, HfO2, and SiO2) has been investigated with ultrashort laser pulses with durations from 25 fs to 1 ps. At all pulse durations the damage threshold is well defined and scales with the bandgap energy of the material. The damage behavior can be described with a phenomenological model taking into account multi-photon excitation, impact ionization, and electron relaxation. The temporal evolution of the dielectric constant of the film following the excitation with pulses below the damage threshold has been measured with time-resolved pump-probe spectroscopy. The complex dielectric constant was retrieved from transient reflection and transmission data.
AB - The damage behavior of five different oxide dielectric thin films (Ta 2O5, TiO22, Al2O23, HfO2, and SiO2) has been investigated with ultrashort laser pulses with durations from 25 fs to 1 ps. At all pulse durations the damage threshold is well defined and scales with the bandgap energy of the material. The damage behavior can be described with a phenomenological model taking into account multi-photon excitation, impact ionization, and electron relaxation. The temporal evolution of the dielectric constant of the film following the excitation with pulses below the damage threshold has been measured with time-resolved pump-probe spectroscopy. The complex dielectric constant was retrieved from transient reflection and transmission data.
KW - Laser damage
KW - Pump-probe spectroscopy
KW - Thin films
KW - Ultrafast processes
UR - http://www.scopus.com/inward/record.url?scp=0041861070&partnerID=8YFLogxK
U2 - 10.1117/12.501361
DO - 10.1117/12.501361
M3 - Conference contribution
AN - SCOPUS:0041861070
SN - 0-8194-4727-7
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 202
EP - 215
BT - Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
PB - SPIE
CY - Bellingham
T2 - Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
Y2 - 16 September 2002 through 18 September 2002
ER -