Feature size below 100 nm realized by UV-LED- based microscope projection photolithography

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Original languageEnglish
Pages (from-to)1-10
Number of pages10
JournalLight: Advanced Manufacturing
Volume4
Issue number4
Early online date16 Nov 2023
Publication statusPublished - 2023

Abstract

The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.

Keywords

    Microfabrication, Nanofabrication, Projection lithography, Subwavelength structuring, UV-LED lithography

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Feature size below 100 nm realized by UV-LED- based microscope projection photolithography. / Zheng, Lei; Birr, Tobias; Zywietz, Urs et al.
In: Light: Advanced Manufacturing, Vol. 4, No. 4, 2023, p. 1-10.

Research output: Contribution to journalArticleResearchpeer review

Zheng, L, Birr, T, Zywietz, U, Reinhardt, C & Roth, B 2023, 'Feature size below 100 nm realized by UV-LED- based microscope projection photolithography', Light: Advanced Manufacturing, vol. 4, no. 4, pp. 1-10. https://doi.org/10.37188/lam.2023.033
Zheng, L., Birr, T., Zywietz, U., Reinhardt, C., & Roth, B. (2023). Feature size below 100 nm realized by UV-LED- based microscope projection photolithography. Light: Advanced Manufacturing, 4(4), 1-10. https://doi.org/10.37188/lam.2023.033
Zheng L, Birr T, Zywietz U, Reinhardt C, Roth B. Feature size below 100 nm realized by UV-LED- based microscope projection photolithography. Light: Advanced Manufacturing. 2023;4(4):1-10. Epub 2023 Nov 16. doi: 10.37188/lam.2023.033
Zheng, Lei ; Birr, Tobias ; Zywietz, Urs et al. / Feature size below 100 nm realized by UV-LED- based microscope projection photolithography. In: Light: Advanced Manufacturing. 2023 ; Vol. 4, No. 4. pp. 1-10.
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AU - Birr, Tobias

AU - Zywietz, Urs

AU - Reinhardt, Carsten

AU - Roth, Bernhard

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