Fabrication of quantum dots with scanning probe nanolithography

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Authors

  • U. F. Keyser
  • H. W. Schumacher
  • U. Zeitler
  • R. J. Haug
  • K. Eberl

Research Organisations

External Research Organisations

  • Max Planck Institute for Solid State Research (MPI-FKF)
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Details

Original languageEnglish
Pages (from-to)681-684
Number of pages4
JournalPhysica Status Solidi (B) Basic Research
Volume224
Issue number3
Publication statusPublished - 1 Apr 2001

Abstract

We are using an atomic force microscope for the direct fabrication of low-dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current-controlled local oxidation it is possible to design devices such as a single-electron transistor with different shapes. In this step-by-step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D-0D-2D and 2D-1D-2D tunneling characteristics.

ASJC Scopus subject areas

Cite this

Fabrication of quantum dots with scanning probe nanolithography. / Keyser, U. F.; Schumacher, H. W.; Zeitler, U. et al.
In: Physica Status Solidi (B) Basic Research, Vol. 224, No. 3, 01.04.2001, p. 681-684.

Research output: Contribution to journalArticleResearchpeer review

Keyser UF, Schumacher HW, Zeitler U, Haug RJ, Eberl K. Fabrication of quantum dots with scanning probe nanolithography. Physica Status Solidi (B) Basic Research. 2001 Apr 1;224(3):681-684. doi: 10.1002/(SICI)1521-3951(200104)224:3<681::AID-PSSB681>3.0.CO;2-D
Keyser, U. F. ; Schumacher, H. W. ; Zeitler, U. et al. / Fabrication of quantum dots with scanning probe nanolithography. In: Physica Status Solidi (B) Basic Research. 2001 ; Vol. 224, No. 3. pp. 681-684.
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@article{208162d0220c4dee97dd7d557072aa64,
title = "Fabrication of quantum dots with scanning probe nanolithography",
abstract = "We are using an atomic force microscope for the direct fabrication of low-dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current-controlled local oxidation it is possible to design devices such as a single-electron transistor with different shapes. In this step-by-step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D-0D-2D and 2D-1D-2D tunneling characteristics.",
author = "Keyser, {U. F.} and Schumacher, {H. W.} and U. Zeitler and Haug, {R. J.} and K. Eberl",
year = "2001",
month = apr,
day = "1",
doi = "10.1002/(SICI)1521-3951(200104)224:3<681::AID-PSSB681>3.0.CO;2-D",
language = "English",
volume = "224",
pages = "681--684",
journal = "Physica Status Solidi (B) Basic Research",
issn = "0370-1972",
publisher = "Wiley-VCH Verlag",
number = "3",

}

Download

TY - JOUR

T1 - Fabrication of quantum dots with scanning probe nanolithography

AU - Keyser, U. F.

AU - Schumacher, H. W.

AU - Zeitler, U.

AU - Haug, R. J.

AU - Eberl, K.

PY - 2001/4/1

Y1 - 2001/4/1

N2 - We are using an atomic force microscope for the direct fabrication of low-dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current-controlled local oxidation it is possible to design devices such as a single-electron transistor with different shapes. In this step-by-step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D-0D-2D and 2D-1D-2D tunneling characteristics.

AB - We are using an atomic force microscope for the direct fabrication of low-dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current-controlled local oxidation it is possible to design devices such as a single-electron transistor with different shapes. In this step-by-step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D-0D-2D and 2D-1D-2D tunneling characteristics.

UR - http://www.scopus.com/inward/record.url?scp=0035531278&partnerID=8YFLogxK

U2 - 10.1002/(SICI)1521-3951(200104)224:3<681::AID-PSSB681>3.0.CO;2-D

DO - 10.1002/(SICI)1521-3951(200104)224:3<681::AID-PSSB681>3.0.CO;2-D

M3 - Article

AN - SCOPUS:0035531278

VL - 224

SP - 681

EP - 684

JO - Physica Status Solidi (B) Basic Research

JF - Physica Status Solidi (B) Basic Research

SN - 0370-1972

IS - 3

ER -

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