Fabrication of double quantum dots by combining afm and e-beam lithography

MC Rogge; C. Fuhner; U.F. Keyser; M. Bichler; G. Abstreiter; W. Wegscheider; RJ Haug

doi:10.1016/j.physe.2003.11.054

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Original language	Undefined/Unknown
Journal	Physica E-Low-Dimensional Systems & Nanostructures
Publication status	Published - 3 Feb 2004

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Fabrication of double quantum dots by combining afm and e-beam lithography. / Rogge, MC; Fuhner, C.; Keyser, U.F. et al.
In: Physica E-Low-Dimensional Systems & Nanostructures, 03.02.2004.

Research output: Contribution to journal › Article › Research › peer review

Rogge, MC, Fuhner, C, Keyser, UF, Bichler, M, Abstreiter, G, Wegscheider, W & Haug, RJ 2004, 'Fabrication of double quantum dots by combining afm and e-beam lithography', Physica E-Low-Dimensional Systems & Nanostructures. https://doi.org/10.1016/j.physe.2003.11.054

Rogge, MC., Fuhner, C., Keyser, U. F., Bichler, M., Abstreiter, G., Wegscheider, W., & Haug, RJ. (2004). Fabrication of double quantum dots by combining afm and e-beam lithography. Physica E-Low-Dimensional Systems & Nanostructures. https://doi.org/10.1016/j.physe.2003.11.054

Rogge MC, Fuhner C, Keyser UF, Bichler M, Abstreiter G, Wegscheider W et al. Fabrication of double quantum dots by combining afm and e-beam lithography. Physica E-Low-Dimensional Systems & Nanostructures. 2004 Feb 3. doi: 10.1016/j.physe.2003.11.054

Rogge, MC ; Fuhner, C. ; Keyser, U.F. et al. / Fabrication of double quantum dots by combining afm and e-beam lithography. In: Physica E-Low-Dimensional Systems & Nanostructures. 2004.

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AU - Rogge, MC

AU - Fuhner, C.

AU - Keyser, U.F.

AU - Bichler, M.

AU - Abstreiter, G.

AU - Wegscheider, W.

AU - Haug, RJ

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Research@Leibniz University

Fabrication of double quantum dots by combining afm and e-beam lithography

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