Details
| Original language | English |
|---|---|
| Article number | 1366-1370 |
| Journal | Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena |
| Volume | 8 |
| Issue number | 6 |
| Publication status | Published - Nov 1990 |
| Externally published | Yes |
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Fabrication of coupled quantum dot arrays with a 100–150 nm period. / Lee, K. Y.; Kern, D. P.; Ismail, K. et al.
In: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, Vol. 8, No. 6, 1366-1370, 11.1990.
In: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, Vol. 8, No. 6, 1366-1370, 11.1990.
Research output: Contribution to journal › Article › Research
Lee, KY, Kern, DP, Ismail, K, Haug, R, Smith, TP, Masselink, WT & Hong, JM 1990, 'Fabrication of coupled quantum dot arrays with a 100–150 nm period', Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, vol. 8, no. 6, 1366-1370. https://doi.org/10.1116/1.585079
Lee, K. Y., Kern, D. P., Ismail, K., Haug, R., Smith, T. P., Masselink, W. T., & Hong, J. M. (1990). Fabrication of coupled quantum dot arrays with a 100–150 nm period. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 8(6), Article 1366-1370. https://doi.org/10.1116/1.585079
Lee KY, Kern DP, Ismail K, Haug R, Smith TP, Masselink WT et al. Fabrication of coupled quantum dot arrays with a 100–150 nm period. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 1990 Nov;8(6):1366-1370. doi: 10.1116/1.585079
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author = "Lee, {K. Y.} and Kern, {D. P.} and K. Ismail and Rolf Haug and Smith, {T. P.} and Masselink, {W. T.} and Hong, {J. M.}",
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Download
TY - JOUR
T1 - Fabrication of coupled quantum dot arrays with a 100–150 nm period
AU - Lee, K. Y.
AU - Kern, D. P.
AU - Ismail, K.
AU - Haug, Rolf
AU - Smith, T. P.
AU - Masselink, W. T.
AU - Hong, J. M.
PY - 1990/11
Y1 - 1990/11
U2 - 10.1116/1.585079
DO - 10.1116/1.585079
M3 - Article
VL - 8
JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
SN - 2166-2746
IS - 6
M1 - 1366-1370
ER -