Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • H. Blaschke
  • Werner Riggers
  • Detlev Ristau

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
  • Laseroptik GmbH
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Details

Original languageEnglish
Title of host publication42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Subtitle of host publication2010
Publication statusPublished - 6 Dec 2010
Event42nd Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2010 - Boulder, CO, United States
Duration: 26 Sept 201029 Sept 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7842
ISSN (Print)0277-786X

Abstract

The paper presents results of investigations in evaporated LaF 3-MgF2 and LaF3-AlF3 classical high-reflecting multilayers deposited on super-polished CaF2 substrates. In addition to typical spectroscopic inspections up to the band edge of fluoride substances in the VUV spectral range, the work is dedicated to the determination of laser-induced damage threshold at moderate pulse numbers for the wavelength 193 nm. Further on, dose dependent irradiation tests are performed well below the fluence level of damage onset indicating changes for the spectral transfer functions. These experimental observations are discussed in order to find a correlation to the characteristic damage behavior of both material combinations. In contrast to the standard evaporation process, partial-reflecting fluoride coatings have been deposited under ion-assisted conditions with fluorine gas. Results of damage tests will show excellent performance to high fluence levels.

Keywords

    fluorine assisted deposition, ISO11254-2, LIDT, metal fluoride composites, thermal evaporation

ASJC Scopus subject areas

Cite this

Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm. / Blaschke, H.; Riggers, Werner; Ristau, Detlev.
42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 78420I (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7842).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Blaschke, H, Riggers, W & Ristau, D 2010, Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm. in 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010., 78420I, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7842, 42nd Annual Laser Damage Symposium, Boulder, CO, United States, 26 Sept 2010. https://doi.org/10.1117/12.867257
Blaschke, H., Riggers, W., & Ristau, D. (2010). Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm. In 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010 Article 78420I (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7842). https://doi.org/10.1117/12.867257
Blaschke H, Riggers W, Ristau D. Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm. In 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. 78420I. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.867257
Blaschke, H. ; Riggers, Werner ; Ristau, Detlev. / Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm. 42nd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2010. 2010. (Proceedings of SPIE - The International Society for Optical Engineering).
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