Evaluation new corner stress relief structure layout for high robust metallization

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Original languageEnglish
Pages (from-to)1977-1981
Number of pages5
JournalMicroelectronics reliability
Volume54
Issue number9-10
Publication statusPublished - 1 Sept 2014

Abstract

For a high robust metallization it is necessary to solve different problems related to migration mechanisms and thermo-mechanical stress in the material. Extended operating conditions and challenging assembling processes influence stress behaviour in chip corners. Typically the corner area of the chip is excluded for use. For higher stress load the forbidden area increases. But effort for demanding mission profiles of a product should not cumulative in increasing chip size. Simulation can help to a better understanding of mechanical stress in the chip corner and chip-package interaction. Corner stress relief structures lower the influence of high thermo-mechanical stress. A high functional corner stress relief structure allows a more efficient chip design. In this work of corner stress relief structure is presented and an evaluation structure is shown which allows to prove the effectiveness of the stress relief.

Keywords

    Chip-package interaction, Corner stress relief structure, Deformation, Evaluation stress monitor, High robust metallization, Mechanical stress

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Cite this

Evaluation new corner stress relief structure layout for high robust metallization. / Hein, V.; Kludt, J.; Weide-Zaage, K.
In: Microelectronics reliability, Vol. 54, No. 9-10, 01.09.2014, p. 1977-1981.

Research output: Contribution to journalArticleResearchpeer review

Hein V, Kludt J, Weide-Zaage K. Evaluation new corner stress relief structure layout for high robust metallization. Microelectronics reliability. 2014 Sept 1;54(9-10):1977-1981. doi: 10.1016/j.microrel.2014.07.039
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@article{55607d205ae444afa08bd76396370fc7,
title = "Evaluation new corner stress relief structure layout for high robust metallization",
abstract = "For a high robust metallization it is necessary to solve different problems related to migration mechanisms and thermo-mechanical stress in the material. Extended operating conditions and challenging assembling processes influence stress behaviour in chip corners. Typically the corner area of the chip is excluded for use. For higher stress load the forbidden area increases. But effort for demanding mission profiles of a product should not cumulative in increasing chip size. Simulation can help to a better understanding of mechanical stress in the chip corner and chip-package interaction. Corner stress relief structures lower the influence of high thermo-mechanical stress. A high functional corner stress relief structure allows a more efficient chip design. In this work of corner stress relief structure is presented and an evaluation structure is shown which allows to prove the effectiveness of the stress relief.",
keywords = "Chip-package interaction, Corner stress relief structure, Deformation, Evaluation stress monitor, High robust metallization, Mechanical stress",
author = "V. Hein and J. Kludt and K. Weide-Zaage",
note = "Publisher Copyright: {\textcopyright} 2014 Elsevier Ltd. All rights reserved. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",
year = "2014",
month = sep,
day = "1",
doi = "10.1016/j.microrel.2014.07.039",
language = "English",
volume = "54",
pages = "1977--1981",
journal = "Microelectronics reliability",
issn = "0026-2714",
publisher = "Elsevier Ltd.",
number = "9-10",

}

Download

TY - JOUR

T1 - Evaluation new corner stress relief structure layout for high robust metallization

AU - Hein, V.

AU - Kludt, J.

AU - Weide-Zaage, K.

N1 - Publisher Copyright: © 2014 Elsevier Ltd. All rights reserved. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2014/9/1

Y1 - 2014/9/1

N2 - For a high robust metallization it is necessary to solve different problems related to migration mechanisms and thermo-mechanical stress in the material. Extended operating conditions and challenging assembling processes influence stress behaviour in chip corners. Typically the corner area of the chip is excluded for use. For higher stress load the forbidden area increases. But effort for demanding mission profiles of a product should not cumulative in increasing chip size. Simulation can help to a better understanding of mechanical stress in the chip corner and chip-package interaction. Corner stress relief structures lower the influence of high thermo-mechanical stress. A high functional corner stress relief structure allows a more efficient chip design. In this work of corner stress relief structure is presented and an evaluation structure is shown which allows to prove the effectiveness of the stress relief.

AB - For a high robust metallization it is necessary to solve different problems related to migration mechanisms and thermo-mechanical stress in the material. Extended operating conditions and challenging assembling processes influence stress behaviour in chip corners. Typically the corner area of the chip is excluded for use. For higher stress load the forbidden area increases. But effort for demanding mission profiles of a product should not cumulative in increasing chip size. Simulation can help to a better understanding of mechanical stress in the chip corner and chip-package interaction. Corner stress relief structures lower the influence of high thermo-mechanical stress. A high functional corner stress relief structure allows a more efficient chip design. In this work of corner stress relief structure is presented and an evaluation structure is shown which allows to prove the effectiveness of the stress relief.

KW - Chip-package interaction

KW - Corner stress relief structure

KW - Deformation

KW - Evaluation stress monitor

KW - High robust metallization

KW - Mechanical stress

UR - http://www.scopus.com/inward/record.url?scp=85028111302&partnerID=8YFLogxK

U2 - 10.1016/j.microrel.2014.07.039

DO - 10.1016/j.microrel.2014.07.039

M3 - Article

AN - SCOPUS:85028111302

VL - 54

SP - 1977

EP - 1981

JO - Microelectronics reliability

JF - Microelectronics reliability

SN - 0026-2714

IS - 9-10

ER -

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