Electronically activated boron-oxygen-related recombination centers in crystalline silicon

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Original languageEnglish
Article number013701
JournalJournal of applied physics
Volume99
Issue number1
Publication statusPublished - 2006
Externally publishedYes

Abstract

Two different boron- and oxygen-related recombination centers are found to be activated in crystalline silicon under illumination or electron injection in the dark, both leading to a severe degradation in the carrier lifetime. While one center forms on a time scale of seconds to minutes, the formation of the second center typically proceeds within hours. In order to reveal the electronic and microscopic properties of both defect centers as well as their formation and annihilation kinetics, we perform time-resolved lifetime measurements on silicon wafers and open-circuit voltage measurements on silicon solar cells at various temperatures. Despite the fact that the two centers are found to form independently of each other, their concentrations exhibit the same linear dependence on the substitutional boron (Bs) and quadratic dependence on the interstitial oxygen (Oi) content. Our results suggest that the fast- and the slowly forming recombination centers correspond to two different configurations of a Bs O2i complex.

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Electronically activated boron-oxygen-related recombination centers in crystalline silicon. / Bothe, Karsten; Schmidt, Jan.
In: Journal of applied physics, Vol. 99, No. 1, 013701, 2006.

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abstract = "Two different boron- and oxygen-related recombination centers are found to be activated in crystalline silicon under illumination or electron injection in the dark, both leading to a severe degradation in the carrier lifetime. While one center forms on a time scale of seconds to minutes, the formation of the second center typically proceeds within hours. In order to reveal the electronic and microscopic properties of both defect centers as well as their formation and annihilation kinetics, we perform time-resolved lifetime measurements on silicon wafers and open-circuit voltage measurements on silicon solar cells at various temperatures. Despite the fact that the two centers are found to form independently of each other, their concentrations exhibit the same linear dependence on the substitutional boron (Bs) and quadratic dependence on the interstitial oxygen (Oi) content. Our results suggest that the fast- and the slowly forming recombination centers correspond to two different configurations of a Bs O2i complex.",
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note = "Funding Information: The authors wish to thank D.W. Palmer for stimulating and informative discussions and R. Brendel for his continuous support and encouragement. S. W. Glunz is acknowledged for providing PERL silicon solar cells with different base doping concentrations and M. Heuer as well as M. Steinhof for sample preparation and solar cell processing. Funding was provided by the State of Lower Saxony and the German Ministry of Education and Research (BMBF) under Contract No. 01SF0009. The ISFH is a member of the German Forschungsverbund Sonnenenergie (FVS).",
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Download

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AU - Bothe, Karsten

AU - Schmidt, Jan

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PY - 2006

Y1 - 2006

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