Electrical transport in ultrathin Cs layers on Si(001)

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Original languageEnglish
Article number115422
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume72
Issue number11
Publication statusPublished - 20 Sept 2005

Abstract

Electrical transport in ultrathin Cs layers on Si(001) has been studied combining macroscopic conductivity measurements with low-energy electron diffraction, energy loss spectroscopy, and measurements of the work function. At temperatures around 150K, growth of the first three atomic layers proceeds layer-by-layer. The completion of each layer correlates with stepwise increases of the surface sheet conductance with coverage. Calibrating the Cs coverage by combined conductivity and work function measurements, the areal density of a single atomic layer is determined as 0.5 monolayers (3.39×1014cm-2). Electron spectroscopy reveals a semiconductor-metal transition of the surface upon completion of the first atomic layer, which correlates with the onset of a macroscopically measured sheet conductance in the 10-5Ω-1 range. While the conductance can be ascribed to electrical transport within surface states, its dependence on temperature indicates an activation barrier, which, most likely, is due to domain boundaries. At coverages of one monolayer and beyond, the Cs Si(001) surface exhibits a high metal-like conductance in the 10-3Ω-1 range.

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Electrical transport in ultrathin Cs layers on Si(001). / Zielasek, Volkmar; Liu, Hong; Shklyaev, A. A. et al.
In: Physical Review B - Condensed Matter and Materials Physics, Vol. 72, No. 11, 115422, 20.09.2005.

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Zielasek V, Liu H, Shklyaev AA, Rugeramigabo EP, Pfnür H. Electrical transport in ultrathin Cs layers on Si(001). Physical Review B - Condensed Matter and Materials Physics. 2005 Sept 20;72(11):115422. doi: 10.1103/PhysRevB.72.115422
Zielasek, Volkmar ; Liu, Hong ; Shklyaev, A. A. et al. / Electrical transport in ultrathin Cs layers on Si(001). In: Physical Review B - Condensed Matter and Materials Physics. 2005 ; Vol. 72, No. 11.
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@article{7bfbaa17813e4cee87a77a173bfddea2,
title = "Electrical transport in ultrathin Cs layers on Si(001)",
abstract = "Electrical transport in ultrathin Cs layers on Si(001) has been studied combining macroscopic conductivity measurements with low-energy electron diffraction, energy loss spectroscopy, and measurements of the work function. At temperatures around 150K, growth of the first three atomic layers proceeds layer-by-layer. The completion of each layer correlates with stepwise increases of the surface sheet conductance with coverage. Calibrating the Cs coverage by combined conductivity and work function measurements, the areal density of a single atomic layer is determined as 0.5 monolayers (3.39×1014cm-2). Electron spectroscopy reveals a semiconductor-metal transition of the surface upon completion of the first atomic layer, which correlates with the onset of a macroscopically measured sheet conductance in the 10-5Ω-1 range. While the conductance can be ascribed to electrical transport within surface states, its dependence on temperature indicates an activation barrier, which, most likely, is due to domain boundaries. At coverages of one monolayer and beyond, the Cs Si(001) surface exhibits a high metal-like conductance in the 10-3Ω-1 range.",
author = "Volkmar Zielasek and Hong Liu and Shklyaev, {A. A.} and Rugeramigabo, {Eddy Patrick} and Herbert Pfn{\"u}r",
year = "2005",
month = sep,
day = "20",
doi = "10.1103/PhysRevB.72.115422",
language = "English",
volume = "72",
journal = "Physical Review B - Condensed Matter and Materials Physics",
issn = "1098-0121",
publisher = "American Institute of Physics",
number = "11",

}

Download

TY - JOUR

T1 - Electrical transport in ultrathin Cs layers on Si(001)

AU - Zielasek, Volkmar

AU - Liu, Hong

AU - Shklyaev, A. A.

AU - Rugeramigabo, Eddy Patrick

AU - Pfnür, Herbert

PY - 2005/9/20

Y1 - 2005/9/20

N2 - Electrical transport in ultrathin Cs layers on Si(001) has been studied combining macroscopic conductivity measurements with low-energy electron diffraction, energy loss spectroscopy, and measurements of the work function. At temperatures around 150K, growth of the first three atomic layers proceeds layer-by-layer. The completion of each layer correlates with stepwise increases of the surface sheet conductance with coverage. Calibrating the Cs coverage by combined conductivity and work function measurements, the areal density of a single atomic layer is determined as 0.5 monolayers (3.39×1014cm-2). Electron spectroscopy reveals a semiconductor-metal transition of the surface upon completion of the first atomic layer, which correlates with the onset of a macroscopically measured sheet conductance in the 10-5Ω-1 range. While the conductance can be ascribed to electrical transport within surface states, its dependence on temperature indicates an activation barrier, which, most likely, is due to domain boundaries. At coverages of one monolayer and beyond, the Cs Si(001) surface exhibits a high metal-like conductance in the 10-3Ω-1 range.

AB - Electrical transport in ultrathin Cs layers on Si(001) has been studied combining macroscopic conductivity measurements with low-energy electron diffraction, energy loss spectroscopy, and measurements of the work function. At temperatures around 150K, growth of the first three atomic layers proceeds layer-by-layer. The completion of each layer correlates with stepwise increases of the surface sheet conductance with coverage. Calibrating the Cs coverage by combined conductivity and work function measurements, the areal density of a single atomic layer is determined as 0.5 monolayers (3.39×1014cm-2). Electron spectroscopy reveals a semiconductor-metal transition of the surface upon completion of the first atomic layer, which correlates with the onset of a macroscopically measured sheet conductance in the 10-5Ω-1 range. While the conductance can be ascribed to electrical transport within surface states, its dependence on temperature indicates an activation barrier, which, most likely, is due to domain boundaries. At coverages of one monolayer and beyond, the Cs Si(001) surface exhibits a high metal-like conductance in the 10-3Ω-1 range.

UR - http://www.scopus.com/inward/record.url?scp=29744450684&partnerID=8YFLogxK

U2 - 10.1103/PhysRevB.72.115422

DO - 10.1103/PhysRevB.72.115422

M3 - Article

AN - SCOPUS:29744450684

VL - 72

JO - Physical Review B - Condensed Matter and Materials Physics

JF - Physical Review B - Condensed Matter and Materials Physics

SN - 1098-0121

IS - 11

M1 - 115422

ER -

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