Details
Original language | English |
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Pages | 55-60 |
Number of pages | 6 |
Publication status | Published - 1997 |
Externally published | Yes |
Event | 1997 Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications, EDMO - London, United Kingdom (UK) Duration: 24 Nov 1997 → 25 Nov 1997 |
Conference
Conference | 1997 Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications, EDMO |
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Country/Territory | United Kingdom (UK) |
City | London |
Period | 24 Nov 1997 → 25 Nov 1997 |
Abstract
In this paper a novel electrical method is described which allows the extraction of bandgap narrowing within the base of SiGe heterojunction bipolar transistors due to heavy doping effects and the presence of germanium. In addition it is shown that the methods sensitivity to doping tails makes it ideal for determining the presence of parasitic energy barriers due to B outdiffusion from the base, a cause of major concern for HBT technology. The analysis is applied to SiGe and SiGeC showing that background carbon incorporation (≈1020 cm-3) completely suppresses TED.
ASJC Scopus subject areas
- Engineering(all)
- General Engineering
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1997. 55-60 Paper presented at 1997 Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications, EDMO, London, United Kingdom (UK).
Research output: Contribution to conference › Paper › Research › peer review
}
TY - CONF
T1 - Electrical determination of bandgap narrowing and parasitic energy barriers in SiGe and SiGeC heterojunction bipolar transistors
AU - Anteney, I. M.
AU - Lippert, G.
AU - Ashburn, P.
AU - Osten, H. J.
AU - Heinemann, B.
AU - Parker, G. J.
PY - 1997
Y1 - 1997
N2 - In this paper a novel electrical method is described which allows the extraction of bandgap narrowing within the base of SiGe heterojunction bipolar transistors due to heavy doping effects and the presence of germanium. In addition it is shown that the methods sensitivity to doping tails makes it ideal for determining the presence of parasitic energy barriers due to B outdiffusion from the base, a cause of major concern for HBT technology. The analysis is applied to SiGe and SiGeC showing that background carbon incorporation (≈1020 cm-3) completely suppresses TED.
AB - In this paper a novel electrical method is described which allows the extraction of bandgap narrowing within the base of SiGe heterojunction bipolar transistors due to heavy doping effects and the presence of germanium. In addition it is shown that the methods sensitivity to doping tails makes it ideal for determining the presence of parasitic energy barriers due to B outdiffusion from the base, a cause of major concern for HBT technology. The analysis is applied to SiGe and SiGeC showing that background carbon incorporation (≈1020 cm-3) completely suppresses TED.
UR - http://www.scopus.com/inward/record.url?scp=0031366817&partnerID=8YFLogxK
M3 - Paper
AN - SCOPUS:0031366817
SP - 55
EP - 60
T2 - 1997 Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications, EDMO
Y2 - 24 November 1997 through 25 November 1997
ER -