Effect of Ge passivation on interfacial properties of crystalline Gd2 O3 thin films grown on Si substrates

Research output: Contribution to journalArticleResearchpeer review

Authors

  • Apurba Laha
  • A. Fissel
  • H. J. Osten
View graph of relations

Details

Original languageEnglish
Article number072903
JournalApplied physics letters
Volume96
Issue number7
Publication statusPublished - 2010

Abstract

The incorporation of few monolayers of Ge chemisorbed on Si surface has been found to have significant impact on the electrical properties of crystalline Gd2 O3 grown epitaxially on Si substrates. Although the Ge coverage on Si surface does not show any influence on the epitaxial quality of Gd2 O3 layers, however, it exhibits a strong impact on their electrical properties. We show that by incorporating few monolayers of Ge at the interface between Gd2 O3 and Si, the capacitance-voltage characteristics, fixed charge and density of interface traps of Pt/ Gd2 O3 /Si capacitor are much superior to those layers grown on clean Si surfaces.

ASJC Scopus subject areas

Cite this

Effect of Ge passivation on interfacial properties of crystalline Gd2 O3 thin films grown on Si substrates. / Laha, Apurba; Fissel, A.; Osten, H. J.
In: Applied physics letters, Vol. 96, No. 7, 072903, 2010.

Research output: Contribution to journalArticleResearchpeer review

Download
@article{8d05d56526f8461abb91da23f7990e37,
title = "Effect of Ge passivation on interfacial properties of crystalline Gd2 O3 thin films grown on Si substrates",
abstract = "The incorporation of few monolayers of Ge chemisorbed on Si surface has been found to have significant impact on the electrical properties of crystalline Gd2 O3 grown epitaxially on Si substrates. Although the Ge coverage on Si surface does not show any influence on the epitaxial quality of Gd2 O3 layers, however, it exhibits a strong impact on their electrical properties. We show that by incorporating few monolayers of Ge at the interface between Gd2 O3 and Si, the capacitance-voltage characteristics, fixed charge and density of interface traps of Pt/ Gd2 O3 /Si capacitor are much superior to those layers grown on clean Si surfaces.",
author = "Apurba Laha and A. Fissel and Osten, {H. J.}",
year = "2010",
doi = "10.1063/1.3318260",
language = "English",
volume = "96",
journal = "Applied physics letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "7",

}

Download

TY - JOUR

T1 - Effect of Ge passivation on interfacial properties of crystalline Gd2 O3 thin films grown on Si substrates

AU - Laha, Apurba

AU - Fissel, A.

AU - Osten, H. J.

PY - 2010

Y1 - 2010

N2 - The incorporation of few monolayers of Ge chemisorbed on Si surface has been found to have significant impact on the electrical properties of crystalline Gd2 O3 grown epitaxially on Si substrates. Although the Ge coverage on Si surface does not show any influence on the epitaxial quality of Gd2 O3 layers, however, it exhibits a strong impact on their electrical properties. We show that by incorporating few monolayers of Ge at the interface between Gd2 O3 and Si, the capacitance-voltage characteristics, fixed charge and density of interface traps of Pt/ Gd2 O3 /Si capacitor are much superior to those layers grown on clean Si surfaces.

AB - The incorporation of few monolayers of Ge chemisorbed on Si surface has been found to have significant impact on the electrical properties of crystalline Gd2 O3 grown epitaxially on Si substrates. Although the Ge coverage on Si surface does not show any influence on the epitaxial quality of Gd2 O3 layers, however, it exhibits a strong impact on their electrical properties. We show that by incorporating few monolayers of Ge at the interface between Gd2 O3 and Si, the capacitance-voltage characteristics, fixed charge and density of interface traps of Pt/ Gd2 O3 /Si capacitor are much superior to those layers grown on clean Si surfaces.

UR - http://www.scopus.com/inward/record.url?scp=77249101651&partnerID=8YFLogxK

U2 - 10.1063/1.3318260

DO - 10.1063/1.3318260

M3 - Article

AN - SCOPUS:77249101651

VL - 96

JO - Applied physics letters

JF - Applied physics letters

SN - 0003-6951

IS - 7

M1 - 072903

ER -