Details
| Original language | English |
|---|---|
| Title of host publication | Magnetic Materials Processes and Devices 14 |
| Publisher | The Electrochemical Society |
| Pages | 59-65 |
| Number of pages | 7 |
| ISBN (print) | 978-160768719-1, 978-1-62332-361-5 |
| Publication status | Published - 2016 |
| Event | Symposium on Magnetic Materials Processes and Devices 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: 2 Oct 2016 → 7 Oct 2016 |
Publication series
| Name | ECS Transactions |
|---|---|
| Publisher | Electrochemical Society, Inc. |
| Number | 2 |
| Volume | 75 |
| ISSN (Print) | 1938-5862 |
Abstract
80Ni-17Fe-3W alloy films are electroplated on Si wafer. The asplated film is smoothed and annealed at different substrate temperature values of 200 °C, 300 °C, 400 °C, and 500 °C. The atomic force microscopy results show that the roughness of the as-plated alloy film increases with an increase in the annealing temperature. It is found that an increase in the annealing temperature, the coercivity increases while the electrical resistivity decreases. The plated alloy film annealed at 500 °C has the highest coercivity of 383 A/m and the lowest resistivity of 25 μohm-cm. The coercivity and electrical resistivity of the samples are measured with the help of a BH-Looper and fourpoint probe techniques, respectively.
ASJC Scopus subject areas
- Engineering(all)
- General Engineering
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Magnetic Materials Processes and Devices 14. The Electrochemical Society, 2016. p. 59-65 (ECS Transactions; Vol. 75, No. 2).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Effect of annealing temperature on the coercivity and the electrical resistivity of the electroplated ni-fe-w alloy film
AU - Mundotiya, Brij Mohan
AU - Rissing, Lutz
AU - Wurz, Marc Christopher
PY - 2016
Y1 - 2016
N2 - 80Ni-17Fe-3W alloy films are electroplated on Si wafer. The asplated film is smoothed and annealed at different substrate temperature values of 200 °C, 300 °C, 400 °C, and 500 °C. The atomic force microscopy results show that the roughness of the as-plated alloy film increases with an increase in the annealing temperature. It is found that an increase in the annealing temperature, the coercivity increases while the electrical resistivity decreases. The plated alloy film annealed at 500 °C has the highest coercivity of 383 A/m and the lowest resistivity of 25 μohm-cm. The coercivity and electrical resistivity of the samples are measured with the help of a BH-Looper and fourpoint probe techniques, respectively.
AB - 80Ni-17Fe-3W alloy films are electroplated on Si wafer. The asplated film is smoothed and annealed at different substrate temperature values of 200 °C, 300 °C, 400 °C, and 500 °C. The atomic force microscopy results show that the roughness of the as-plated alloy film increases with an increase in the annealing temperature. It is found that an increase in the annealing temperature, the coercivity increases while the electrical resistivity decreases. The plated alloy film annealed at 500 °C has the highest coercivity of 383 A/m and the lowest resistivity of 25 μohm-cm. The coercivity and electrical resistivity of the samples are measured with the help of a BH-Looper and fourpoint probe techniques, respectively.
UR - http://www.scopus.com/inward/record.url?scp=84991584963&partnerID=8YFLogxK
U2 - 10.1149/07502.0059ecst
DO - 10.1149/07502.0059ecst
M3 - Conference contribution
AN - SCOPUS:84991584963
SN - 978-160768719-1
SN - 978-1-62332-361-5
T3 - ECS Transactions
SP - 59
EP - 65
BT - Magnetic Materials Processes and Devices 14
PB - The Electrochemical Society
T2 - Symposium on Magnetic Materials Processes and Devices 14 - PRiME 2016/230th ECS Meeting
Y2 - 2 October 2016 through 7 October 2016
ER -