Defect formation in oxide thin films

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Authors

  • Lars O. Jensen
  • Frank Wagner
  • Mathias Mende
  • Céline Gouldieff
  • Holger Blaschke
  • Jean Yves Natoli
  • Detlev Ristau

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
  • Ecole Centrale Marseille
  • JENOPTIK Optical Systems GmbH
View graph of relations

Details

Original languageEnglish
Title of host publication43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Subtitle of host publication2011
Publication statusPublished - 22 Nov 2011
Externally publishedYes
Event43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011 - Boulder, CO, United States
Duration: 18 Sept 2010 → 21 Sept 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8190
ISSN (Print)0277-786X

Abstract

In nanosecond laser damage investigations, the specific defect density in the optical component or thin film plays the key role in triggering optical breakdown. UV irradiation can induce additional defects in optical materials before the damaging event takes place. This increased defect density can even be the main cause for UV laser damage as shown before in fused silica. Moving on to oxide thin films, this contribution will present studies on SiO 2, Al 2O 3, and HfO 2 ion beam sputtered coatings. Pure material single layers as well as composite material single layers comprised of two oxides have been investigated concerning their tendency to generate additional defects resulting from UV laser irradiation. Within this work, tests at 355 nm and 266 nm have been performed and are compared.

Keywords

    co-deposition, defect density, ion beam sputtering, irradiation induced defects, laser-induced damage

ASJC Scopus subject areas

Cite this

Defect formation in oxide thin films. / Jensen, Lars O.; Wagner, Frank; Mende, Mathias et al.
43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. 81900D (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8190).

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Jensen, LO, Wagner, F, Mende, M, Gouldieff, C, Blaschke, H, Natoli, JY & Ristau, D 2011, Defect formation in oxide thin films. in 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011., 81900D, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8190, 43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011, Boulder, CO, United States, 18 Sept 2010. https://doi.org/10.1117/12.899113
Jensen, L. O., Wagner, F., Mende, M., Gouldieff, C., Blaschke, H., Natoli, J. Y., & Ristau, D. (2011). Defect formation in oxide thin films. In 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011 Article 81900D (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8190). https://doi.org/10.1117/12.899113
Jensen LO, Wagner F, Mende M, Gouldieff C, Blaschke H, Natoli JY et al. Defect formation in oxide thin films. In 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. 81900D. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.899113
Jensen, Lars O. ; Wagner, Frank ; Mende, Mathias et al. / Defect formation in oxide thin films. 43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2011. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
Download
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