Controlled mechanical AFM machining of two-dimensional electron systems: Fabrication of a single-electron transistor

Research output: Contribution to journalConference articleResearchpeer review

Authors

  • H. W. Schumacher
  • U. F. Keyser
  • U. Zeitler
  • R. J. Haug
  • K. Eberl

Research Organisations

External Research Organisations

  • Max Planck Institute for Solid State Research (MPI-FKF)
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Details

Original languageEnglish
Pages (from-to)860-863
Number of pages4
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume6
Issue number1
Publication statusPublished - Feb 2000
Event13th International Conference on the Electronic Properties of Two-Dimensional Systems (EP2DS-13) - Ottawa, Ont, Canada
Duration: 1 Aug 19996 Aug 1999

Abstract

By mechanical scratching the surface of a GaAs/AlGaAs heterostructure with an atomic force microscope an energetic barrier for the two-dimensional electron gas is formed. The barrier formation is in situ controlled by measuring the room-temperature resistance across the barrier. Barrier heights can be tuned from some mV up to more than 100 mV as determined by measurement of the thermally activated current. Low-resistance barriers show typical tunnelling behaviour at low temperatures whereas high-resistance lines show GΩ resistances in a bias range up to some 10 V allowing their use as in-plane gates. Transport measurements of a side gated single-electron transistor fabricated this way are presented.

ASJC Scopus subject areas

Cite this

Controlled mechanical AFM machining of two-dimensional electron systems: Fabrication of a single-electron transistor. / Schumacher, H. W.; Keyser, U. F.; Zeitler, U. et al.
In: Physica E: Low-Dimensional Systems and Nanostructures, Vol. 6, No. 1, 02.2000, p. 860-863.

Research output: Contribution to journalConference articleResearchpeer review

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Download

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T2 - 13th International Conference on the Electronic Properties of Two-Dimensional Systems (EP2DS-13)

AU - Schumacher, H. W.

AU - Keyser, U. F.

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AU - Haug, R. J.

AU - Eberl, K.

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AB - By mechanical scratching the surface of a GaAs/AlGaAs heterostructure with an atomic force microscope an energetic barrier for the two-dimensional electron gas is formed. The barrier formation is in situ controlled by measuring the room-temperature resistance across the barrier. Barrier heights can be tuned from some mV up to more than 100 mV as determined by measurement of the thermally activated current. Low-resistance barriers show typical tunnelling behaviour at low temperatures whereas high-resistance lines show GΩ resistances in a bias range up to some 10 V allowing their use as in-plane gates. Transport measurements of a side gated single-electron transistor fabricated this way are presented.

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