Details
Original language | English |
---|---|
Pages (from-to) | 355-366 |
Number of pages | 12 |
Journal | Surface science |
Volume | 347 |
Issue number | 3 |
Publication status | Published - 20 Feb 1996 |
Abstract
The NO+H2 reaction on Rh(110) has been investigated between 480 and 650 K under isothermal low-pressure conditions at 10-6 and 10-5 mbar. Photoemission electron microscopy (PEEM) was used as a spatially resolving method. Depending on the experimental parameters, a variety of different chemical wave patterns such as elliptically and rectangularly shaped target patterns or travelling wave fragments were found. The existence range of these patterns has been mapped out in the pH2, T-parameter range for fixed pNO = 1.6 × 10-6 mbar. In low energy electron diffraction (LEED) a number of different nitrogen and oxygen induced reconstructions was observed in the pattern-forming parameter range. The variations in the shape of the wave patterns were traced to the presence of adsorbate-induced reconstructions with different anisotropy caused by atomic oxygen and atomic nitrogen, respectively.
Keywords
- Low energy electron diffraction (LEED), Low index single crystal surfaces, Nitrogen oxides, Photoemission electron microscopy, Rhodium, Surface chemical reaction
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Materials Science(all)
- Surfaces, Coatings and Films
- Materials Science(all)
- Materials Chemistry
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In: Surface science, Vol. 347, No. 3, 20.02.1996, p. 355-366.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Control of the shape of chemical wave patterns in the NO + H2 reaction on Rh(110) by adsorbate-induced reconstructions
AU - Mertens, F.
AU - Imbihl, R.
PY - 1996/2/20
Y1 - 1996/2/20
N2 - The NO+H2 reaction on Rh(110) has been investigated between 480 and 650 K under isothermal low-pressure conditions at 10-6 and 10-5 mbar. Photoemission electron microscopy (PEEM) was used as a spatially resolving method. Depending on the experimental parameters, a variety of different chemical wave patterns such as elliptically and rectangularly shaped target patterns or travelling wave fragments were found. The existence range of these patterns has been mapped out in the pH2, T-parameter range for fixed pNO = 1.6 × 10-6 mbar. In low energy electron diffraction (LEED) a number of different nitrogen and oxygen induced reconstructions was observed in the pattern-forming parameter range. The variations in the shape of the wave patterns were traced to the presence of adsorbate-induced reconstructions with different anisotropy caused by atomic oxygen and atomic nitrogen, respectively.
AB - The NO+H2 reaction on Rh(110) has been investigated between 480 and 650 K under isothermal low-pressure conditions at 10-6 and 10-5 mbar. Photoemission electron microscopy (PEEM) was used as a spatially resolving method. Depending on the experimental parameters, a variety of different chemical wave patterns such as elliptically and rectangularly shaped target patterns or travelling wave fragments were found. The existence range of these patterns has been mapped out in the pH2, T-parameter range for fixed pNO = 1.6 × 10-6 mbar. In low energy electron diffraction (LEED) a number of different nitrogen and oxygen induced reconstructions was observed in the pattern-forming parameter range. The variations in the shape of the wave patterns were traced to the presence of adsorbate-induced reconstructions with different anisotropy caused by atomic oxygen and atomic nitrogen, respectively.
KW - Low energy electron diffraction (LEED)
KW - Low index single crystal surfaces
KW - Nitrogen oxides
KW - Photoemission electron microscopy
KW - Rhodium
KW - Surface chemical reaction
UR - http://www.scopus.com/inward/record.url?scp=0030085450&partnerID=8YFLogxK
U2 - 10.1016/0039-6028(95)00994-9
DO - 10.1016/0039-6028(95)00994-9
M3 - Article
AN - SCOPUS:0030085450
VL - 347
SP - 355
EP - 366
JO - Surface science
JF - Surface science
SN - 0039-6028
IS - 3
ER -