Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon

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  • Institute for Solar Energy Research (ISFH)
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Details

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages1077-1080
Number of pages4
Publication statusPublished - 2003
Externally publishedYes
Event3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: 11 May 200318 May 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeB

Abstract

Two important aspects of the formation mechanism of the metastable defect specific to boron-doped Czochralski silicon (Cz-Si) are investigated in detail. In the first part of the paper the impact of boron and oxygen on the defect formation process is investigated. Lifetime measurements performed on a large number of different silicon materials yield a quadratic dependence of the light-induced metastable defect concentration Nt* on the interstitial oxygen concentration [Oi] for samples with oxygen concentrations greater than 4×1017 cm-3 while for samples with lower oxygen concentrations the dependence is found to be almost linear. All samples show a linear dependence of Nt* on the substitutional boron concentration. The second part of the paper is devoted to the fast performance loss at the beginning of the degradation process. A thorough analysis of temperature-dependent measurements of the degradation of the open-circuit voltage of Cz-Si solar cells during illumination reveals a two-step mechanism. While the time constant of the fast initial degradation is found to be independent of temperature, an activation energy of 0.37 eV is determined for the slower degradation process.

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Cite this

Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon. / Bothe, Karsten; Schmidt, Jan; Hezel, Rudolf.
Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. ed. / K. Kurokawa; L.L. Kazmerski; B. McNeils; M. Yamaguchi; C. Wronski. 2003. p. 1077-1080 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. B).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Bothe, K, Schmidt, J & Hezel, R 2003, Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon. in K Kurokawa, LL Kazmerski, B McNeils, M Yamaguchi & C Wronski (eds), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, vol. B, pp. 1077-1080, 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11 May 2003.
Bothe, K., Schmidt, J., & Hezel, R. (2003). Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon. In K. Kurokawa, L. L. Kazmerski, B. McNeils, M. Yamaguchi, & C. Wronski (Eds.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion (pp. 1077-1080). (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. B).
Bothe K, Schmidt J, Hezel R. Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon. In Kurokawa K, Kazmerski LL, McNeils B, Yamaguchi M, Wronski C, editors, Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. 2003. p. 1077-1080. (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Bothe, Karsten ; Schmidt, Jan ; Hezel, Rudolf. / Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon. Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. editor / K. Kurokawa ; L.L. Kazmerski ; B. McNeils ; M. Yamaguchi ; C. Wronski. 2003. pp. 1077-1080 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
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title = "Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon",
abstract = "Two important aspects of the formation mechanism of the metastable defect specific to boron-doped Czochralski silicon (Cz-Si) are investigated in detail. In the first part of the paper the impact of boron and oxygen on the defect formation process is investigated. Lifetime measurements performed on a large number of different silicon materials yield a quadratic dependence of the light-induced metastable defect concentration Nt* on the interstitial oxygen concentration [Oi] for samples with oxygen concentrations greater than 4×1017 cm-3 while for samples with lower oxygen concentrations the dependence is found to be almost linear. All samples show a linear dependence of Nt* on the substitutional boron concentration. The second part of the paper is devoted to the fast performance loss at the beginning of the degradation process. A thorough analysis of temperature-dependent measurements of the degradation of the open-circuit voltage of Cz-Si solar cells during illumination reveals a two-step mechanism. While the time constant of the fast initial degradation is found to be independent of temperature, an activation energy of 0.37 eV is determined for the slower degradation process.",
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Download

TY - GEN

T1 - Comprehensive analysis of the impact of boron and oxygen on the metastable defect in Cz silicon

AU - Bothe, Karsten

AU - Schmidt, Jan

AU - Hezel, Rudolf

PY - 2003

Y1 - 2003

N2 - Two important aspects of the formation mechanism of the metastable defect specific to boron-doped Czochralski silicon (Cz-Si) are investigated in detail. In the first part of the paper the impact of boron and oxygen on the defect formation process is investigated. Lifetime measurements performed on a large number of different silicon materials yield a quadratic dependence of the light-induced metastable defect concentration Nt* on the interstitial oxygen concentration [Oi] for samples with oxygen concentrations greater than 4×1017 cm-3 while for samples with lower oxygen concentrations the dependence is found to be almost linear. All samples show a linear dependence of Nt* on the substitutional boron concentration. The second part of the paper is devoted to the fast performance loss at the beginning of the degradation process. A thorough analysis of temperature-dependent measurements of the degradation of the open-circuit voltage of Cz-Si solar cells during illumination reveals a two-step mechanism. While the time constant of the fast initial degradation is found to be independent of temperature, an activation energy of 0.37 eV is determined for the slower degradation process.

AB - Two important aspects of the formation mechanism of the metastable defect specific to boron-doped Czochralski silicon (Cz-Si) are investigated in detail. In the first part of the paper the impact of boron and oxygen on the defect formation process is investigated. Lifetime measurements performed on a large number of different silicon materials yield a quadratic dependence of the light-induced metastable defect concentration Nt* on the interstitial oxygen concentration [Oi] for samples with oxygen concentrations greater than 4×1017 cm-3 while for samples with lower oxygen concentrations the dependence is found to be almost linear. All samples show a linear dependence of Nt* on the substitutional boron concentration. The second part of the paper is devoted to the fast performance loss at the beginning of the degradation process. A thorough analysis of temperature-dependent measurements of the degradation of the open-circuit voltage of Cz-Si solar cells during illumination reveals a two-step mechanism. While the time constant of the fast initial degradation is found to be independent of temperature, an activation energy of 0.37 eV is determined for the slower degradation process.

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SN - 9784990181604

T3 - Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

SP - 1077

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BT - Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion

A2 - Kurokawa, K.

A2 - Kazmerski, L.L.

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ER -

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