Details
| Original language | English |
|---|---|
| Pages (from-to) | 2515-2518 |
| Number of pages | 4 |
| Journal | Journal of Optoelectronics and Advanced Materials |
| Volume | 10 |
| Issue number | 10 |
| Publication status | Published - Oct 2008 |
| Externally published | Yes |
Abstract
Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
Keywords
- Antireflection coatings, Evaporated inhomogeneous coatings, High damage threshold coatings
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
- Physics and Astronomy(all)
- Condensed Matter Physics
- Engineering(all)
- Electrical and Electronic Engineering
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In: Journal of Optoelectronics and Advanced Materials, Vol. 10, No. 10, 10.2008, p. 2515-2518.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Co-deposition of double layer antireflection coatings and laser induced damage threshold (LIDT) measurements at 1064 nm
T2 - Inhomogeneous systems
AU - Javed Akhtar, S. M.
AU - Mittendorf, F.
AU - Schink, H.
AU - Ristau, Detlev
AU - Ebert, Jürgen
AU - Welling, Herbert
PY - 2008/10
Y1 - 2008/10
N2 - Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
AB - Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented.
KW - Antireflection coatings
KW - Evaporated inhomogeneous coatings
KW - High damage threshold coatings
UR - http://www.scopus.com/inward/record.url?scp=55349111153&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:55349111153
VL - 10
SP - 2515
EP - 2518
JO - Journal of Optoelectronics and Advanced Materials
JF - Journal of Optoelectronics and Advanced Materials
SN - 1454-4164
IS - 10
ER -