Details
| Original language | English |
|---|---|
| Title of host publication | Topics in Applied Physics |
| Pages | 53-89 |
| Number of pages | 37 |
| Publication status | Published - 2019 |
| Externally published | Yes |
Publication series
| Name | Topics in Applied Physics |
|---|---|
| Volume | 121 |
| ISSN (Print) | 0303-4216 |
| ISSN (electronic) | 1437-0859 |
Abstract
In this chapter the chemical mechanical polishing of nanocrystalline diamond film is presented. It is shown that it is possible to polish a superhard material like nanocrystalline diamond with a much softer material like silica. It has also been demonstrated that this technique can be used for removing polishing marks on single crystal diamond. Experiments with other oxides like ceria and alumina showed polishing action on nanocrystalline diamond films. Surface roughness reduction rate was found to be inversely proportional to the size of abrasive material. Addition of redox agents to the polishing slurry accelerated the roughness reduction of nanocrystalline diamond films. Based on the experimental results and theoretical studies by other groups we have proposed a polishing mechanism for chemical mechanical polishing of diamond. Lastly, we have applied this technique to study its effect on superconducting diamond films. It was found that even after 14 h of polishing, superconductivity in diamond remained unchanged.
Keywords
- Boron doped diamond, Chemical mechanical polishing, Nanocrystalline diamond, SF1, SUBA-X, Single crystal diamond, Size dependence, Superconductivity
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physics and Astronomy (miscellaneous)
Cite this
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Topics in Applied Physics. 2019. p. 53-89 (Topics in Applied Physics; Vol. 121).
Research output: Chapter in book/report/conference proceeding › Contribution to book/anthology › Research › peer review
}
TY - CHAP
T1 - Chemical mechanical polishing of nanocrystalline diamond
AU - Mandal, Soumen
AU - Thomas, E.L.H.
AU - Werrell, J.M.
AU - Klemencic, G.M.
AU - Ash, J.
AU - Brousseau, E.B.
AU - Williams, O.A.
N1 - Publisher Copyright: © Springer Nature Switzerland AG 2019.
PY - 2019
Y1 - 2019
N2 - In this chapter the chemical mechanical polishing of nanocrystalline diamond film is presented. It is shown that it is possible to polish a superhard material like nanocrystalline diamond with a much softer material like silica. It has also been demonstrated that this technique can be used for removing polishing marks on single crystal diamond. Experiments with other oxides like ceria and alumina showed polishing action on nanocrystalline diamond films. Surface roughness reduction rate was found to be inversely proportional to the size of abrasive material. Addition of redox agents to the polishing slurry accelerated the roughness reduction of nanocrystalline diamond films. Based on the experimental results and theoretical studies by other groups we have proposed a polishing mechanism for chemical mechanical polishing of diamond. Lastly, we have applied this technique to study its effect on superconducting diamond films. It was found that even after 14 h of polishing, superconductivity in diamond remained unchanged.
AB - In this chapter the chemical mechanical polishing of nanocrystalline diamond film is presented. It is shown that it is possible to polish a superhard material like nanocrystalline diamond with a much softer material like silica. It has also been demonstrated that this technique can be used for removing polishing marks on single crystal diamond. Experiments with other oxides like ceria and alumina showed polishing action on nanocrystalline diamond films. Surface roughness reduction rate was found to be inversely proportional to the size of abrasive material. Addition of redox agents to the polishing slurry accelerated the roughness reduction of nanocrystalline diamond films. Based on the experimental results and theoretical studies by other groups we have proposed a polishing mechanism for chemical mechanical polishing of diamond. Lastly, we have applied this technique to study its effect on superconducting diamond films. It was found that even after 14 h of polishing, superconductivity in diamond remained unchanged.
KW - Boron doped diamond
KW - Chemical mechanical polishing
KW - Nanocrystalline diamond
KW - SF1
KW - SUBA-X
KW - Single crystal diamond
KW - Size dependence
KW - Superconductivity
UR - http://www.scopus.com/inward/record.url?scp=85064732684&partnerID=8YFLogxK
U2 - 10.1007/978-3-030-12469-4_3
DO - 10.1007/978-3-030-12469-4_3
M3 - Contribution to book/anthology
T3 - Topics in Applied Physics
SP - 53
EP - 89
BT - Topics in Applied Physics
ER -