Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • K. Schmalz
  • H. Rucker
  • I. N. Yassievich
  • H. G. Grimmeiss
  • W. Mehr
  • H. Rankenfeld
  • H. J. Osten
  • P. Schley
  • I. Bababskaya

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Title of host publicationGrowth, Processing, and Characterization of Semiconductor Heterostructures
Pages389-394
Number of pages6
Publication statusPublished - 1994
Externally publishedYes
Event1993 Fall Meeting of the Materials Research Society - Boston, United States
Duration: 29 Nov 19932 Dec 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume326
ISSN (Print)0272-9172

Abstract

The aim of the present work is to present a study of carrier capture and emission processes in p-type Si/Si1-xGexSi QW structures. A n+ p-diode with buried Si1-xGex layer was used which allowed DLTS- and admittance spectroscopy on the same QW.

ASJC Scopus subject areas

Cite this

Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy. / Schmalz, K.; Rucker, H.; Yassievich, I. N. et al.
Growth, Processing, and Characterization of Semiconductor Heterostructures. 1994. p. 389-394 (Materials Research Society Symposium Proceedings; Vol. 326).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Schmalz, K, Rucker, H, Yassievich, IN, Grimmeiss, HG, Mehr, W, Rankenfeld, H, Osten, HJ, Schley, P & Bababskaya, I 1994, Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy. in Growth, Processing, and Characterization of Semiconductor Heterostructures. Materials Research Society Symposium Proceedings, vol. 326, pp. 389-394, 1993 Fall Meeting of the Materials Research Society, Boston, Massachusetts, United States, 29 Nov 1993.
Schmalz, K., Rucker, H., Yassievich, I. N., Grimmeiss, H. G., Mehr, W., Rankenfeld, H., Osten, H. J., Schley, P., & Bababskaya, I. (1994). Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy. In Growth, Processing, and Characterization of Semiconductor Heterostructures (pp. 389-394). (Materials Research Society Symposium Proceedings; Vol. 326).
Schmalz K, Rucker H, Yassievich IN, Grimmeiss HG, Mehr W, Rankenfeld H et al. Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy. In Growth, Processing, and Characterization of Semiconductor Heterostructures. 1994. p. 389-394. (Materials Research Society Symposium Proceedings).
Schmalz, K. ; Rucker, H. ; Yassievich, I. N. et al. / Characterization of valence band offsets in P-Si/SiGe/Si by space charge spectroscopy. Growth, Processing, and Characterization of Semiconductor Heterostructures. 1994. pp. 389-394 (Materials Research Society Symposium Proceedings).
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abstract = "The aim of the present work is to present a study of carrier capture and emission processes in p-type Si/Si1-xGexSi QW structures. A n+ p-diode with buried Si1-xGex layer was used which allowed DLTS- and admittance spectroscopy on the same QW.",
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AU - Mehr, W.

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