Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • K. Schmalz
  • H. Rücker
  • H. G. Grimmeiss
  • B. Dietrich
  • H. Frankenfeld
  • W. Mehr
  • H. J. Osten
  • P. Schley

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Title of host publicationGettering and Defect Engineering in Semiconductor Technology, GADEST 93
EditorsH.G. Grimmeiss, M. Kittler, H. Richter
Pages595-600
Number of pages6
Publication statusPublished - Dec 1993
Externally publishedYes
Event5th International Autumn Meeting on Gettering and Defect Engineering in Semiconductor Technology, GADEST 1993 - Chossewitz, Frankfurt (Oder), Germany
Duration: 9 Oct 199314 Oct 1993

Publication series

NameSolid State Phenomena
Volume32-33
ISSN (Print)1012-0394
ISSN (electronic)1662-9779

Abstract

Capture and emission proceses of holes in quantum well (QW) structures are investigated using admittance spectroscopy and DLTS. A direct comparison of both methods is given for p- Si/S1-XGex/Si n+p mesa diodes with x = 0.17. The experimental results are analysed taking into account the external electric field as well as internal electric fields induced by holes confined in the QW. The temperature dependence of potential barriers at the QW and of the Fermi level determine the activation energy Ea of the conductance across the QW. From Ea band offset of ΔEV = 0.16 eV was estimated. DLTS data suggest that hole emission from QW was observed with activation energy in correspondence with ΔEV.

ASJC Scopus subject areas

Cite this

Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes. / Schmalz, K.; Rücker, H.; Grimmeiss, H. G. et al.
Gettering and Defect Engineering in Semiconductor Technology, GADEST 93. ed. / H.G. Grimmeiss; M. Kittler; H. Richter. 1993. p. 595-600 (Solid State Phenomena; Vol. 32-33).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Schmalz, K, Rücker, H, Grimmeiss, HG, Dietrich, B, Frankenfeld, H, Mehr, W, Osten, HJ & Schley, P 1993, Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes. in HG Grimmeiss, M Kittler & H Richter (eds), Gettering and Defect Engineering in Semiconductor Technology, GADEST 93. Solid State Phenomena, vol. 32-33, pp. 595-600, 5th International Autumn Meeting on Gettering and Defect Engineering in Semiconductor Technology, GADEST 1993, Chossewitz, Frankfurt (Oder), Germany, 9 Oct 1993. https://doi.org/10.4028/www.scientific.net/SSP.32-33.595
Schmalz, K., Rücker, H., Grimmeiss, H. G., Dietrich, B., Frankenfeld, H., Mehr, W., Osten, H. J., & Schley, P. (1993). Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes. In H. G. Grimmeiss, M. Kittler, & H. Richter (Eds.), Gettering and Defect Engineering in Semiconductor Technology, GADEST 93 (pp. 595-600). (Solid State Phenomena; Vol. 32-33). https://doi.org/10.4028/www.scientific.net/SSP.32-33.595
Schmalz K, Rücker H, Grimmeiss HG, Dietrich B, Frankenfeld H, Mehr W et al. Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes. In Grimmeiss HG, Kittler M, Richter H, editors, Gettering and Defect Engineering in Semiconductor Technology, GADEST 93. 1993. p. 595-600. (Solid State Phenomena). doi: 10.4028/www.scientific.net/SSP.32-33.595
Schmalz, K. ; Rücker, H. ; Grimmeiss, H. G. et al. / Characterization of MBE grown Si/Si1-x(Gex/Si structures using n+ p-diodes. Gettering and Defect Engineering in Semiconductor Technology, GADEST 93. editor / H.G. Grimmeiss ; M. Kittler ; H. Richter. 1993. pp. 595-600 (Solid State Phenomena).
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