Details
Original language | English |
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Title of host publication | Advances in Optical Interference Coatings |
Subtitle of host publication | 25 - 27 May 1999, Berlin, Germany |
Place of Publication | Bellingham |
Pages | 76-80 |
Number of pages | 5 |
Publication status | Published - 7 Sept 1999 |
Externally published | Yes |
Event | 1999 Advances in Optical Interference Coatings - Berlin, Ger Duration: 25 May 1999 → 27 May 1999 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Publisher | SPIE |
Volume | 3738 |
ISSN (Print) | 0277-786X |
Abstract
SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
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Advances in Optical Interference Coatings: 25 - 27 May 1999, Berlin, Germany. Bellingham, 1999. p. 76-80 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3738).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Broad-band antireflection coatings deposited with ion-assisted evaporation
AU - Laux, Sven
AU - Kaiser, Norbert
AU - Niederwald, Hansjoerg
AU - Mertin, Michael
AU - Ehlers, Henrik
AU - Ristau, Detlev
PY - 1999/9/7
Y1 - 1999/9/7
N2 - SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
AB - SiO2, Ta2O5, and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R<0.5% in a spectral region of 400 nm to 700 nm with each of these coating designs. The lowest average reflection can be obtained with a layer system containing MgF2. The absorption of such AR coatings mostly exceeds that of all-oxide systems in the shorter wavelength region (<450 nm). With scanning scratch tests the scratch resistance of the coatings have been determined relative to each other.
UR - http://www.scopus.com/inward/record.url?scp=0032664220&partnerID=8YFLogxK
U2 - 10.1117/12.360066
DO - 10.1117/12.360066
M3 - Conference contribution
AN - SCOPUS:0032664220
SN - 0-8194-3212-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 76
EP - 80
BT - Advances in Optical Interference Coatings
CY - Bellingham
T2 - 1999 Advances in Optical Interference Coatings
Y2 - 25 May 1999 through 27 May 1999
ER -