Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Andreas Wolf
  • Barbara Terheiden
  • Rolf Brendel

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
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Details

Original languageEnglish
Title of host publicationConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
PublisherIEEE Computer Society
Pages992-995
Number of pages4
ISBN (print)1424400163, 9781424400164, 1-4244-0017-1
Publication statusPublished - 2006
Externally publishedYes
Event2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) - Waikoloa, HI, United States
Duration: 7 May 200612 May 2006
Conference number: 4

Abstract

The generation of an emitter in monocrystalline silicon thin-film solar cells by out-diffusion of dopant atoms from the growth substrate into the epitaxial layer is demonstrated. Starting with a boron-doped p+-type substrate, a porous silicon surface layer is created to permit the layer transfer (PSI process). A p+-type emitter automatically forms by out-diffusion of boron atoms during the epitaxial growth of n-type silicon films. This "autodiffusion" process creates an emitter with a moderate surface concentration of 3×1018 cm-3 and a junction depth of 1.1 μm. The sheet resistance is 330 Ω/□. n-type thin-film solar cells with an autodiffused boron emitter on the rear side of the cells are fabricated. An independently confirmed energy conversion efficiency of 14.5 % with a short circuit current density of 33.3 mA/cm2 as measured under standard testing conditions is achieved for a 4 cm2 large cell with a thickness of 24 μm.

ASJC Scopus subject areas

Sustainable Development Goals

Cite this

Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. / Wolf, Andreas; Terheiden, Barbara; Brendel, Rolf.
Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. p. 992-995 4059797.

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Wolf, A, Terheiden, B & Brendel, R 2006, Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4., 4059797, IEEE Computer Society, pp. 992-995, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4), Waikoloa, HI, United States, 7 May 2006. https://doi.org/10.1109/WCPEC.2006.279285
Wolf, A., Terheiden, B., & Brendel, R. (2006). Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (pp. 992-995). Article 4059797 IEEE Computer Society. https://doi.org/10.1109/WCPEC.2006.279285
Wolf A, Terheiden B, Brendel R. Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society. 2006. p. 992-995. 4059797 doi: 10.1109/WCPEC.2006.279285
Wolf, Andreas ; Terheiden, Barbara ; Brendel, Rolf. / Autodiffused boron emitter for n-type monocrystalline SI thin-film solar cells. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. pp. 992-995
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