Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Jan Schmidt
  • Agnes Merkle
  • B. Hoex
  • M. C.M. Van De Sanden
  • W. M.M. Kessels
  • Rolf Brendel

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
  • Eindhoven University of Technology (TU/e)
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Details

Original languageEnglish
Title of host publication33rd IEEE Photovoltaic Specialists Conference, PVSC 2008
ISBN (electronic)9781424416417
Publication statusPublished - 2008
Externally publishedYes
Event33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 - San Diego, CA, United States
Duration: 11 May 200816 May 2008

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Abstract

We present independently confirmed efficiencies above 20% for PERC-type solar cells with the point-contacted rear being either passivated by atomic-layer-deposited Al2O3 or by stacks consisting of an ultrathin Al2O3 film and a thicker PECVD-SiOx layer. Internal quantum efficiency measurements reveal that the effective rear surface recombination velocities of the single-layer Al2O 3-passivated cells are comparable to those measured on reference cells passivated by an aluminum-annealed thermal SiO2, while those of the Al2O3/SiOx-passivated cells are even lower. Very low effective rear surface recombination velocities of only 70 cm/s are reported for the Al2O3/SiOx stacks, including metalized areas on the cell rear.

ASJC Scopus subject areas

Cite this

Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. / Schmidt, Jan; Merkle, Agnes; Hoex, B. et al.
33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922636 (Conference Record of the IEEE Photovoltaic Specialists Conference).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Schmidt, J, Merkle, A, Hoex, B, Van De Sanden, MCM, Kessels, WMM & Brendel, R 2008, Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. in 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008., 4922636, Conference Record of the IEEE Photovoltaic Specialists Conference, 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008, San Diego, CA, United States, 11 May 2008. https://doi.org/10.1109/PVSC.2008.4922636
Schmidt, J., Merkle, A., Hoex, B., Van De Sanden, M. C. M., Kessels, W. M. M., & Brendel, R. (2008). Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. In 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 Article 4922636 (Conference Record of the IEEE Photovoltaic Specialists Conference). https://doi.org/10.1109/PVSC.2008.4922636
Schmidt J, Merkle A, Hoex B, Van De Sanden MCM, Kessels WMM, Brendel R. Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. In 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922636. (Conference Record of the IEEE Photovoltaic Specialists Conference). doi: 10.1109/PVSC.2008.4922636
Schmidt, Jan ; Merkle, Agnes ; Hoex, B. et al. / Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. (Conference Record of the IEEE Photovoltaic Specialists Conference).
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title = "Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells",
abstract = "We present independently confirmed efficiencies above 20% for PERC-type solar cells with the point-contacted rear being either passivated by atomic-layer-deposited Al2O3 or by stacks consisting of an ultrathin Al2O3 film and a thicker PECVD-SiOx layer. Internal quantum efficiency measurements reveal that the effective rear surface recombination velocities of the single-layer Al2O 3-passivated cells are comparable to those measured on reference cells passivated by an aluminum-annealed thermal SiO2, while those of the Al2O3/SiOx-passivated cells are even lower. Very low effective rear surface recombination velocities of only 70 cm/s are reported for the Al2O3/SiOx stacks, including metalized areas on the cell rear.",
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AU - Merkle, Agnes

AU - Hoex, B.

AU - Van De Sanden, M. C.M.

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