Details
| Original language | English |
|---|---|
| Title of host publication | Quantum Electronics and Laser Science Conference (QELS 2000) |
| Publisher | IEEE Computer Society |
| Number of pages | 1 |
| ISBN (print) | 1-55752-608-7 |
| Publication status | Published - 6 Aug 2000 |
| Event | Quantum Electronics and Laser Science Conference (QELS 2000) - San Francisco, CA, USA Duration: 7 May 2000 → 12 May 2000 |
Publication series
| Name | OSA trends in optics and photonics : TOPS |
|---|---|
| Volume | 40 |
| ISSN (Print) | 1094-5695 |
Abstract
Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.
ASJC Scopus subject areas
- Physics and Astronomy(all)
- General Physics and Astronomy
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Quantum Electronics and Laser Science Conference (QELS 2000). IEEE Computer Society, 2000. (OSA trends in optics and photonics : TOPS; Vol. 40).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Atom lithography with cold metastable Ne* atoms
AU - Engels, P.
AU - Ertmer, W.
AU - Sengstock, K.
PY - 2000/8/6
Y1 - 2000/8/6
N2 - Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.
AB - Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.
UR - http://www.scopus.com/inward/record.url?scp=0034544228&partnerID=8YFLogxK
M3 - Conference contribution
SN - 1-55752-608-7
T3 - OSA trends in optics and photonics : TOPS
BT - Quantum Electronics and Laser Science Conference (QELS 2000)
PB - IEEE Computer Society
T2 - Quantum Electronics and Laser Science Conference (QELS 2000)
Y2 - 7 May 2000 through 12 May 2000
ER -