Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

External Research Organisations

  • Fraunhofer Institute for Solar Energy Systems (ISE)
  • Institute for Solar Energy Research (ISFH)
View graph of relations

Details

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages919-922
Number of pages4
Publication statusPublished - 2003
Externally publishedYes
Event3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: 11 May 200318 May 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeA

Abstract

The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

ASJC Scopus subject areas

Cite this

Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. / Glunz, S. W.; Schäffer, E.; Rein, S. et al.
Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. ed. / K. Kurokawa; L.L. Kazmerski; B. McNeils; M. Yamaguchi; C. Wronski. 2003. p. 919-922 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. A).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Glunz, SW, Schäffer, E, Rein, S, Bothe, K & Schmidt, J 2003, Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. in K Kurokawa, LL Kazmerski, B McNeils, M Yamaguchi & C Wronski (eds), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, vol. A, pp. 919-922, 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11 May 2003.
Glunz, S. W., Schäffer, E., Rein, S., Bothe, K., & Schmidt, J. (2003). Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. In K. Kurokawa, L. L. Kazmerski, B. McNeils, M. Yamaguchi, & C. Wronski (Eds.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion (pp. 919-922). (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. A).
Glunz SW, Schäffer E, Rein S, Bothe K, Schmidt J. Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. In Kurokawa K, Kazmerski LL, McNeils B, Yamaguchi M, Wronski C, editors, Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. 2003. p. 919-922. (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Glunz, S. W. ; Schäffer, E. ; Rein, S. et al. / Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. editor / K. Kurokawa ; L.L. Kazmerski ; B. McNeils ; M. Yamaguchi ; C. Wronski. 2003. pp. 919-922 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Download
@inproceedings{d1166bee33444f3495bffa77e684a676,
title = "Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells",
abstract = "The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.",
author = "Glunz, {S. W.} and E. Sch{\"a}ffer and S. Rein and K. Bothe and J. Schmidt",
year = "2003",
language = "English",
isbn = "4990181603",
series = "Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion",
pages = "919--922",
editor = "K. Kurokawa and L.L. Kazmerski and B. McNeils and M. Yamaguchi and C. Wronski",
booktitle = "Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion",
note = "3rd World Conference on Photovoltaic Energy Conversion ; Conference date: 11-05-2003 Through 18-05-2003",

}

Download

TY - GEN

T1 - Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells

AU - Glunz, S. W.

AU - Schäffer, E.

AU - Rein, S.

AU - Bothe, K.

AU - Schmidt, J.

PY - 2003

Y1 - 2003

N2 - The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

AB - The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

UR - http://www.scopus.com/inward/record.url?scp=6344240819&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:6344240819

SN - 4990181603

SN - 9784990181604

T3 - Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

SP - 919

EP - 922

BT - Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion

A2 - Kurokawa, K.

A2 - Kazmerski, L.L.

A2 - McNeils, B.

A2 - Yamaguchi, M.

A2 - Wronski, C.

T2 - 3rd World Conference on Photovoltaic Energy Conversion

Y2 - 11 May 2003 through 18 May 2003

ER -

By the same author(s)