Details
| Original language | English |
|---|---|
| Pages (from-to) | 13883 |
| Number of pages | 1 |
| Journal | Optics express |
| Volume | 26 |
| Issue number | 11 |
| Publication status | Published - 2018 |
| Externally published | Yes |
Abstract
A hybrid group IV ridge waveguide platform is demonstrated, with potential application across the optical spectrum from ultraviolet to the far infrared wavelengths. The waveguides are fabricated by partial etching of sub-micron ridges in a nanocrystalline diamond thin film grown on top of a silicon wafer. To create vertical confinement, the diamond film is locally undercut by exposing the chip to an isotropic fluorine plasma etch via etch holes surrounding the waveguides, resulting in a mechanically stable suspended air-clad waveguide platform. Optical characterization of the waveguides at 1550 nm yields an average optical loss of 4.67 ± 0.47 dB/mm. Further improvement to the fabrication process is expected to significantly reduce this waveguide loss.
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In: Optics express, Vol. 26, No. 11, 2018, p. 13883.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Air-clad suspended nanocrystalline diamond ridge waveguides
AU - Abdou, A.
AU - Panduranga, P.
AU - Richter, J.
AU - Thomas, E.L.H.
AU - Mandal, Soumen
AU - Williams, O.A.
AU - Witzens, J.
AU - Nezhad, M.P.
N1 - Publisher Copyright: © 2018 Optical Society of America
PY - 2018
Y1 - 2018
N2 - A hybrid group IV ridge waveguide platform is demonstrated, with potential application across the optical spectrum from ultraviolet to the far infrared wavelengths. The waveguides are fabricated by partial etching of sub-micron ridges in a nanocrystalline diamond thin film grown on top of a silicon wafer. To create vertical confinement, the diamond film is locally undercut by exposing the chip to an isotropic fluorine plasma etch via etch holes surrounding the waveguides, resulting in a mechanically stable suspended air-clad waveguide platform. Optical characterization of the waveguides at 1550 nm yields an average optical loss of 4.67 ± 0.47 dB/mm. Further improvement to the fabrication process is expected to significantly reduce this waveguide loss.
AB - A hybrid group IV ridge waveguide platform is demonstrated, with potential application across the optical spectrum from ultraviolet to the far infrared wavelengths. The waveguides are fabricated by partial etching of sub-micron ridges in a nanocrystalline diamond thin film grown on top of a silicon wafer. To create vertical confinement, the diamond film is locally undercut by exposing the chip to an isotropic fluorine plasma etch via etch holes surrounding the waveguides, resulting in a mechanically stable suspended air-clad waveguide platform. Optical characterization of the waveguides at 1550 nm yields an average optical loss of 4.67 ± 0.47 dB/mm. Further improvement to the fabrication process is expected to significantly reduce this waveguide loss.
UR - http://www.scopus.com/inward/record.url?scp=85047775924&partnerID=8YFLogxK
U2 - 10.1364/OE.26.013883
DO - 10.1364/OE.26.013883
M3 - Article
VL - 26
SP - 13883
JO - Optics express
JF - Optics express
SN - 1094-4087
IS - 11
ER -