Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach

Research output: Contribution to journalArticleResearchpeer review

Authors

  • Carsten Schmitz
  • Henrik Ehlers
  • Detlev Ristau

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Pages (from-to)8203-8210
Number of pages8
JournalApplied Optics
Volume51
Issue number34
Publication statusPublished - 1 Dec 2012

Abstract

If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.

ASJC Scopus subject areas

Cite this

Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach. / Schmitz, Carsten; Ehlers, Henrik; Ristau, Detlev.
In: Applied Optics, Vol. 51, No. 34, 01.12.2012, p. 8203-8210.

Research output: Contribution to journalArticleResearchpeer review

Schmitz C, Ehlers H, Ristau D. Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach. Applied Optics. 2012 Dec 1;51(34):8203-8210. doi: 10.1364/AO.51.008203
Schmitz, Carsten ; Ehlers, Henrik ; Ristau, Detlev. / Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach. In: Applied Optics. 2012 ; Vol. 51, No. 34. pp. 8203-8210.
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