Absolute measurement of thermophysical and optical thin-film properties by photothermal methods for the investigation of laser damage

Research output: Contribution to journalConference articleResearchpeer review

Authors

  • Eberhard Welsch
  • K. Ettrich
  • D. Ristau
  • Uwe Willamowski

External Research Organisations

  • Friedrich Schiller University Jena
  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Pages (from-to)965-976
Number of pages12
JournalInternational Journal of Thermophysics
Volume20
Issue number3
Publication statusPublished - May 1999
Externally publishedYes
Event1997 13th Symposium Thermophysical Properties in Honor of Ared Cezairliyan - Boulder, CO, USA
Duration: 22 Jun 199727 Jun 1997

Abstract

Perspectives and limits of the application of the photothermal technique are given for the measurement of absorption, thermal, and thermoelastic properties in thin films. The peculiarities of this technique in the frequency and time domains are discussed in some detail, and selected important results with respect to laser damage studies in optical coatings are pointed out. Emphasis is placed on the absolute measurement of both optical and thermophysical properties in dielectric materials in thin-film form and, also, on the influence of both absorption and changed thermal properties in thin films on their thermally induced laser damage resistance.

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Absolute measurement of thermophysical and optical thin-film properties by photothermal methods for the investigation of laser damage. / Welsch, Eberhard; Ettrich, K.; Ristau, D. et al.
In: International Journal of Thermophysics, Vol. 20, No. 3, 05.1999, p. 965-976.

Research output: Contribution to journalConference articleResearchpeer review

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@article{6bcf155adff1422592a5b6003e84aacd,
title = "Absolute measurement of thermophysical and optical thin-film properties by photothermal methods for the investigation of laser damage",
abstract = "Perspectives and limits of the application of the photothermal technique are given for the measurement of absorption, thermal, and thermoelastic properties in thin films. The peculiarities of this technique in the frequency and time domains are discussed in some detail, and selected important results with respect to laser damage studies in optical coatings are pointed out. Emphasis is placed on the absolute measurement of both optical and thermophysical properties in dielectric materials in thin-film form and, also, on the influence of both absorption and changed thermal properties in thin films on their thermally induced laser damage resistance.",
author = "Eberhard Welsch and K. Ettrich and D. Ristau and Uwe Willamowski",
note = "Funding information: E. Welsch and K. Ettrich acknowledge support by NATO Grant CRG 940652. K. Ettrich wishes to thank the Gottfried Daimler-und Carl Benz Stiftung for financial support. The support of the Bundesministerium fur Bildung, Wissenschaft, Forschung und Technologic (Contract 13EU0140/1, EUREKA-Projekt CHOCLAB) is gratefully acknowledged by D. Ristau and U. Willamowski.; 1997 13th Symposium Thermophysical Properties in Honor of Ared Cezairliyan ; Conference date: 22-06-1997 Through 27-06-1997",
year = "1999",
month = may,
doi = "10.1023/A:1022603823628",
language = "English",
volume = "20",
pages = "965--976",
journal = "International Journal of Thermophysics",
issn = "0195-928X",
publisher = "Springer New York",
number = "3",

}

Download

TY - JOUR

T1 - Absolute measurement of thermophysical and optical thin-film properties by photothermal methods for the investigation of laser damage

AU - Welsch, Eberhard

AU - Ettrich, K.

AU - Ristau, D.

AU - Willamowski, Uwe

N1 - Funding information: E. Welsch and K. Ettrich acknowledge support by NATO Grant CRG 940652. K. Ettrich wishes to thank the Gottfried Daimler-und Carl Benz Stiftung for financial support. The support of the Bundesministerium fur Bildung, Wissenschaft, Forschung und Technologic (Contract 13EU0140/1, EUREKA-Projekt CHOCLAB) is gratefully acknowledged by D. Ristau and U. Willamowski.

PY - 1999/5

Y1 - 1999/5

N2 - Perspectives and limits of the application of the photothermal technique are given for the measurement of absorption, thermal, and thermoelastic properties in thin films. The peculiarities of this technique in the frequency and time domains are discussed in some detail, and selected important results with respect to laser damage studies in optical coatings are pointed out. Emphasis is placed on the absolute measurement of both optical and thermophysical properties in dielectric materials in thin-film form and, also, on the influence of both absorption and changed thermal properties in thin films on their thermally induced laser damage resistance.

AB - Perspectives and limits of the application of the photothermal technique are given for the measurement of absorption, thermal, and thermoelastic properties in thin films. The peculiarities of this technique in the frequency and time domains are discussed in some detail, and selected important results with respect to laser damage studies in optical coatings are pointed out. Emphasis is placed on the absolute measurement of both optical and thermophysical properties in dielectric materials in thin-film form and, also, on the influence of both absorption and changed thermal properties in thin films on their thermally induced laser damage resistance.

UR - http://www.scopus.com/inward/record.url?scp=0033131994&partnerID=8YFLogxK

U2 - 10.1023/A:1022603823628

DO - 10.1023/A:1022603823628

M3 - Conference article

AN - SCOPUS:0033131994

VL - 20

SP - 965

EP - 976

JO - International Journal of Thermophysics

JF - International Journal of Thermophysics

SN - 0195-928X

IS - 3

T2 - 1997 13th Symposium Thermophysical Properties in Honor of Ared Cezairliyan

Y2 - 22 June 1997 through 27 June 1997

ER -