Details
| Original language | English |
|---|---|
| Pages (from-to) | 426-431 |
| Number of pages | 6 |
| Journal | LANGMUIR |
| Volume | 29 |
| Issue number | 1 |
| Publication status | Published - 3 Dec 2012 |
| Externally published | Yes |
Abstract
Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.
ASJC Scopus subject areas
- Materials Science(all)
- General Materials Science
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Chemistry(all)
- Spectroscopy
- Chemistry(all)
- Electrochemistry
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In: LANGMUIR, Vol. 29, No. 1, 03.12.2012, p. 426-431.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization
AU - De Marco, Carmela
AU - Gaidukeviciute, Arune
AU - Kiyan, Roman
AU - Eaton, Shane M.
AU - Levi, Marinella
AU - Osellame, Roberto
AU - Chichkov, Boris N.
AU - Turri, Stefano
PY - 2012/12/3
Y1 - 2012/12/3
N2 - Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.
AB - Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.
UR - http://www.scopus.com/inward/record.url?scp=84872108155&partnerID=8YFLogxK
U2 - 10.1021/la303799u
DO - 10.1021/la303799u
M3 - Article
AN - SCOPUS:84872108155
VL - 29
SP - 426
EP - 431
JO - LANGMUIR
JF - LANGMUIR
SN - 0743-7463
IS - 1
ER -