100 % reflectivity from a monolithic dielectric micro-structured surface

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Frank Brückner
  • Tina Clausnitzer
  • Oliver Burmeister
  • Daniel Friedrich
  • Ernst Bernhard Kley
  • Karsten Danzmann
  • Andreas Tünnermann
  • Roman Schnabel

Research Organisations

External Research Organisations

  • Friedrich Schiller University Jena
  • Max Planck Institute for Gravitational Physics (Albert Einstein Institute)
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Details

Original languageEnglish
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics
Publication statusPublished - Jan 2008
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics - San Jose, CA, United States
Duration: 21 Jan 200823 Jan 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6883
ISSN (Print)0277-786X

Abstract

Here, we propose a new mirror architecture which is solely based upon a monolithic dielectric micro-structured surface. Hence, the mirror device, which consists of a possibly mono-crystalline bulk material, can in principle simultaneously provide perfect reflectivity and lowest mechanical loss. By specifically structuring the monolithic surface, resulting in T-shaped ridges of a subwavelength grating, a resonant behavior of light coupling can be realized, leading to theoretically 100% reflectivity.

Keywords

    Micro-optical device, Monolithic mirror, Resonant grating, Waveguide grating

ASJC Scopus subject areas

Cite this

100 % reflectivity from a monolithic dielectric micro-structured surface. / Brückner, Frank; Clausnitzer, Tina; Burmeister, Oliver et al.
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics. 2008. 68830X (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6883).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Brückner, F, Clausnitzer, T, Burmeister, O, Friedrich, D, Kley, EB, Danzmann, K, Tünnermann, A & Schnabel, R 2008, 100 % reflectivity from a monolithic dielectric micro-structured surface. in Advanced Fabrication Technologies for Micro/Nano Optics and Photonics., 68830X, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, San Jose, CA, United States, 21 Jan 2008. https://doi.org/10.1117/12.767775
Brückner, F., Clausnitzer, T., Burmeister, O., Friedrich, D., Kley, E. B., Danzmann, K., Tünnermann, A., & Schnabel, R. (2008). 100 % reflectivity from a monolithic dielectric micro-structured surface. In Advanced Fabrication Technologies for Micro/Nano Optics and Photonics Article 68830X (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6883). https://doi.org/10.1117/12.767775
Brückner F, Clausnitzer T, Burmeister O, Friedrich D, Kley EB, Danzmann K et al. 100 % reflectivity from a monolithic dielectric micro-structured surface. In Advanced Fabrication Technologies for Micro/Nano Optics and Photonics. 2008. 68830X. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.767775
Brückner, Frank ; Clausnitzer, Tina ; Burmeister, Oliver et al. / 100 % reflectivity from a monolithic dielectric micro-structured surface. Advanced Fabrication Technologies for Micro/Nano Optics and Photonics. 2008. (Proceedings of SPIE - The International Society for Optical Engineering).
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AU - Danzmann, Karsten

AU - Tünnermann, Andreas

AU - Schnabel, Roman

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