Publications
- 2006
- Published
Approaches to CMOS integration of epitaxial gadolinium oxide high-K dielectrics
Gottlob, H. D. B., Echtermeyer, T., Mollenhauer, T., Schmidt, M., Efavi, J. K., Wahlbrink, T., Lemme, M. C., Kurz, H., Endres, R., Stefanov, Y., Schwalke, U., Czernohorsky, M., Bugiel, E., Fissel, A. & Osten, H. J., 2006, ESSDERC 2006 : Proceedings of the 36th European Solid-State Device Research Conference. IEEE Computer Society, p. 150-153 4 p. 4099878Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
- Published
Energy relaxation and anomalies in the thermo-acoustic response of femtosecond laser-excited germanium
Sokolowski-Tinten, K., Shymanovich, U., Nicoul, M., Blums, J., Tarasevitch, A., Horn-von-Hoegen, M., von der Linde, D., Morak, A. & Wietler, T., 2006, International Conference on Ultrafast Phenomena, UP 2006. OSA - The Optical Society, (Optics InfoBase Conference Papers).Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
- Published
Optical properties, elasto-optical effects, and critical-point parameters of biaxially stressed Si1-yCy alloys on Si (001)
Zollner, S., Vartanian, V., Liu, J. P., Zaumseil, P., Osten, H. J., Demkov, A. A. & Nguyen, B. Y., 2006, Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest. 1715973. (Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest; vol. 2006).Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
- 2005
- Published
Surfactant-mediated epitaxy of relaxed low-doped Ge films on Si(001) with low defect densities
Wietler, T. F., Bugiel, E. & Hofmann, K. R., 24 Oct 2005, In: Applied physics letters. 87, 18, p. 1-3 3 p., 182102.Research output: Contribution to journal › Article › Research › peer review
- Published
MBE growth and properties of epitaxial metal oxides for high-κ dielectrics
Osten, H. J., Bugiel, E., Kirfel, O., Czernohorsky, M. & Fissel, A., 1 May 2005, In: Journal of crystal growth. 278, 1-4, p. 18-24 7 p.Research output: Contribution to journal › Conference article › Research › peer review
- Published
Epitaxial growth of non-cubic silicon
Fissel, A., Wang, C., Bugiel, E. & Osten, H. J., Mar 2005, In: Microelectronics journal. 36, 3-6, p. 506-509 4 p.Research output: Contribution to journal › Conference article › Research › peer review
- Published
Advances in surfactant-mediated growth of germanium on silicon: High-quality p-type Ge films on Si
Wietler, T. F., Ott, A., Bugiel, E. & Hofmann, K. R., Feb 2005, In: Materials Science in Semiconductor Processing. 8, 1-3 SPEC. ISS., p. 73-77 5 p.Research output: Contribution to journal › Article › Research › peer review
- Published
Ca F2 SiCa F2 resonant tunneling diodes grown by B surfactant-mediated epitaxy
Wang, C. R., Bierkandt, M., Paprotta, S., Wietler, T. & Hofmann, K. R., 14 Jan 2005, In: Applied physics letters. 86, 3, p. 1-3 3 p., 033111.Research output: Contribution to journal › Article › Research › peer review
- Published
Carbon doping of sige
Osten, H. J., 1 Jan 2005, Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy. p. 2.9-157-2.9-170Research output: Chapter in book/report/conference proceeding › Contribution to book/anthology › Research › peer review
- Published
A novel thin buffer concept for epitaxial growth of relaxed SiGe layers with low threading dislocation density
Liu, J. P., Wong, L. H., Sohn, D. K., Hsia, L. C., Chan, L., Wong, C. C. & Osten, H. J., Jan 2005, In: Electrochemical and Solid-State Letters. 8, 2, p. G60-G62Research output: Contribution to journal › Article › Research › peer review
- 2004
- Published
Boron surfactant enhanced growth of thin Si films on CaF2/SI
Wang, C. R., Müller, B. H., Bugiel, E., Wietler, T., Bierkandt, M., Hofmann, K. R. & Zaumseil, P., 7 Oct 2004, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 22, 6, p. 2246-2250 5 p.Research output: Contribution to journal › Article › Research › peer review
- Published
Epitaxial high-κ dielectrics on silicon
Osten, H. J., 2004, ASDAM 2004 - Conference Proceedings, 5th International Conference on Semiconductor Devices and Microsystmes. Osvald, J., Hascik, S., Osvald, J. & Hascik, S. (eds.). p. 155-162 8 p. (ASDAM 2004 - Conference Proceedings, 5th International Conference on Semiconductor Devices and Microsystmes).Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
- 2003
- Published
Epitaxial praseodymium oxide: a new high-K dielectric
Osten, H. J., Bugiel, E. & Fissel, A., Dec 2003, In: Solid-State Electronics. 47, 12, p. 2161-2165 5 p.Research output: Contribution to journal › Article › Research › peer review
- Published
Towards understanding epitaxial growth of alternative high-K dielectrics on Si(001): Application to praseodymium oxide
Fissel, A., Osten, H. J. & Bugiel, E., 5 Aug 2003, In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21, 4, p. 1765-1772 8 p.Research output: Contribution to journal › Article › Research › peer review
- Published
Epitaxial praseodymium oxide: A new high-K dielectric
Osten, H. J., Bugiel, E. & Fissel, A., 1 Apr 2003, In: Materials Research Society Symposium - Proceedings. 744, p. 15-24 10 p.Research output: Contribution to journal › Conference article › Research › peer review
- 2000
- Published
Carbon doped SiGe heterojunction bipolar transistor module suitable for integration in a deep submicron CMOS process
Osten, H. J., Knoll, D., Heinemann, B., Rucker, H. & Ehwald, K. E., 2000, p. 19. 1 p.Research output: Contribution to conference › Paper › Research › peer review
- 1995
- Published
Growth and properties of strained Si1-x-yGexC y layers
Jain, S. C., Osten, H. J., Dietrich, B. & Rücker, H., 1995, In: Semiconductor Science and Technology. 10, 10, p. 1289-1302 14 p., 001.Research output: Contribution to journal › Review article › Research › peer review