Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 156-162 |
Seitenumfang | 7 |
Fachzeitschrift | ACS Applied Nano Materials |
Jahrgang | 2 |
Ausgabenummer | 1 |
Frühes Online-Datum | 21 Dez. 2018 |
Publikationsstatus | Veröffentlicht - 25 Jan. 2019 |
Abstract
One of the ways to use graphene in field effect transistors is to introduce a band gap by quantum confinement effect. That is why narrow graphene nanoribbons (GNRs) with width less than 50 nm are considered to be essential components in future graphene electronics. The growth of graphene on sidewalls of SiC(0001) mesa structures using scalable photolithography was shown to produce high quality GNRs with excellent transport properties. Such epitaxial graphene nanoribbons are very important in fundamental science but if GNRs are supposed to be used in advanced nanoelectronics, high quality thin (<50 nm) nanoribbons should be produced on a large (wafer) scale. Here we present a technique for scalable template growth of high quality GNRs on Si-face of SiC(0001) and provide detailed structural information along with transport properties. For the first time we succeeded now to avoid SiC-facet instabilities in order to grow high quality GNRs along both [11 00] and [112 0] crystallographic directions on the same substrate. The quality of the grown nanoribbons was confirmed by comprehensive characterization with atomic resolution STM, dark field LEEM, and transport measurements. This approach generates an entirely new platform for both fundamental and application driven research of quasi one-dimensional carbon based magnetism and spintronics.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Allgemeine Materialwissenschaften
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in: ACS Applied Nano Materials, Jahrgang 2, Nr. 1, 25.01.2019, S. 156-162.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Wafer Scale Growth and Characterization of Edge Specific Graphene Nanoribbons for Nanoelectronics
AU - Zakharov, Alexei A.
AU - Vinogradov, Nikolay A.
AU - Aprojanz, Johannes
AU - Nguyen, Thi Thuy Nhung
AU - Tegenkamp, Christoph
AU - Struzzi, Claudia
AU - Iakimov, Tihomir
AU - Yakimova, Rositsa
AU - Jokubavicius, Valdas
N1 - Acknowledgments: Financial support by the Deutsche Forschungsgemeinschaft (Grants Te386/12-1 and Te 386/13-1) is gratefully acknowledged by J.A. and C.T. A.A.Z, C.S., and N.A.V. acknowledge Vetenskaps-rådet (TAILSPIN Project). R.Y. acknowledges financial support by the Swedish Agency for Strategic Research (SSF) via Projects GMT14-0077 and RMA15-0024.
PY - 2019/1/25
Y1 - 2019/1/25
N2 - One of the ways to use graphene in field effect transistors is to introduce a band gap by quantum confinement effect. That is why narrow graphene nanoribbons (GNRs) with width less than 50 nm are considered to be essential components in future graphene electronics. The growth of graphene on sidewalls of SiC(0001) mesa structures using scalable photolithography was shown to produce high quality GNRs with excellent transport properties. Such epitaxial graphene nanoribbons are very important in fundamental science but if GNRs are supposed to be used in advanced nanoelectronics, high quality thin (<50 nm) nanoribbons should be produced on a large (wafer) scale. Here we present a technique for scalable template growth of high quality GNRs on Si-face of SiC(0001) and provide detailed structural information along with transport properties. For the first time we succeeded now to avoid SiC-facet instabilities in order to grow high quality GNRs along both [11 00] and [112 0] crystallographic directions on the same substrate. The quality of the grown nanoribbons was confirmed by comprehensive characterization with atomic resolution STM, dark field LEEM, and transport measurements. This approach generates an entirely new platform for both fundamental and application driven research of quasi one-dimensional carbon based magnetism and spintronics.
AB - One of the ways to use graphene in field effect transistors is to introduce a band gap by quantum confinement effect. That is why narrow graphene nanoribbons (GNRs) with width less than 50 nm are considered to be essential components in future graphene electronics. The growth of graphene on sidewalls of SiC(0001) mesa structures using scalable photolithography was shown to produce high quality GNRs with excellent transport properties. Such epitaxial graphene nanoribbons are very important in fundamental science but if GNRs are supposed to be used in advanced nanoelectronics, high quality thin (<50 nm) nanoribbons should be produced on a large (wafer) scale. Here we present a technique for scalable template growth of high quality GNRs on Si-face of SiC(0001) and provide detailed structural information along with transport properties. For the first time we succeeded now to avoid SiC-facet instabilities in order to grow high quality GNRs along both [11 00] and [112 0] crystallographic directions on the same substrate. The quality of the grown nanoribbons was confirmed by comprehensive characterization with atomic resolution STM, dark field LEEM, and transport measurements. This approach generates an entirely new platform for both fundamental and application driven research of quasi one-dimensional carbon based magnetism and spintronics.
KW - 4-probe STM
KW - graphene nanoribbons (GNR)
KW - LEED
KW - LEEM
KW - SiC mesa structure
KW - STM
KW - transport properties
UR - http://www.scopus.com/inward/record.url?scp=85065646213&partnerID=8YFLogxK
U2 - 10.1021/acsanm.8b01780
DO - 10.1021/acsanm.8b01780
M3 - Article
AN - SCOPUS:85065646213
VL - 2
SP - 156
EP - 162
JO - ACS Applied Nano Materials
JF - ACS Applied Nano Materials
IS - 1
ER -